Abstract

Ta2O5 and Nb2O5 films are deposited on BK7 glass substrates using an electron beam evaporation method and are annealed at 673 K in the air. In this letter, comparative studies of the optical transmittance, microstructure, chemical composition, optical absorption, and laser-induced damage threshold (LIDT) of the two films are conducted. Findings indicate that the substoichiometric defect is very harmful to the laser damage resistance of Ta2O5 and Nb2O5 films. The decrease of absorption improves the LIDT in films deposited by the same material. However, although the absorption of the Ta2O5 single layer is less than that of the Nb2O5 single layer, the LIDT of the former is lower than that of the latter. High-reflective (HR) coatings have a higher LIDT than single layers due to the thermal dissipation of the SiO2 layers and the decreased electric field intensity (EFI). In addition, the Nb2O5 HR coating achieves the highest LIDT at 25.6 J/cm2 in both single layers and HR coatings.

© 2011 Chinese Optics Letters

PDF Article

References

  • View by:
  • |
  • |
  • |

  1. T. J. Rehg, J. A. Ochoa-Tapia, A. Knoesen, and B. G. Higgins, Appl. Opt. 28, 5215 (1989).
  2. C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).
  3. P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).
  4. X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).
  5. J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).
  6. G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).
  7. Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).
  8. H. Hu, Z. Fan, and F. Luo, Appl. Opt. 40, 1950 (2001).
  9. J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).
  10. C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).
  11. H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).
  12. L. Yuan, Y. A. Zhao, G. Q. Shang, C. R. Wang, H. B. He, J. D. Shao, and Z. X. Fan, J. Opt. Soc. Am. B 24, 538 (2007).

2010

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

2009

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

2007

2006

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

2003

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

2001

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

H. Hu, Z. Fan, and F. Luo, Appl. Opt. 40, 1950 (2001).

1990

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

1989

T. J. Rehg, J. A. Ochoa-Tapia, A. Knoesen, and B. G. Higgins, Appl. Opt. 28, 5215 (1989).

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Abromavicius, G.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Amassian, A.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Baczewski, L.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Buzelis, R.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Campbell, J. H.

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Chen, S.

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Ciosek, J.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Drazdys, R.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Fan, Z.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

H. Hu, Z. Fan, and F. Luo, Appl. Opt. 40, 1950 (2001).

Fan, Z. X.

L. Yuan, Y. A. Zhao, G. Q. Shang, C. R. Wang, H. B. He, J. D. Shao, and Z. X. Fan, J. Opt. Soc. Am. B 24, 538 (2007).

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

Gong, H.

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

Gonzales, R. P.

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Guo, L.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

He, H. B.

Higgins, B. G.

Hu, H.

Juskenas, R.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Kawamoto, Y.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

Kimura, S.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

Kisu, T.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

Klemberg-Sapieha, J. E.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Knoesen, A.

Kozlowski, M. R.

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Li, D.

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

Li, S.

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

Ling, X.

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

Luo, F.

Luo, J.

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Ma, P.

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Marczak, J.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Martinu, L.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Masse, J.-P.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Melninkaitis, A.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Miksys, D.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Morgan, A. J.

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Mukai, K.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

Nishioka, Y.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

Ochoa-Tapia, J. A.

Ostrowski, R.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Pan, F.

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Pankowski, P.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Paszkowicz, W.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Pelka, J.

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

Qiang, Y.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

R.Wolfe, C.

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Rainer, F.

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

Rehg, T. J.

Selskis, A.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Shang, G. Q.

Shao, J.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

Shao, J. D.

L. Yuan, Y. A. Zhao, G. Q. Shang, C. R. Wang, H. B. He, J. D. Shao, and Z. X. Fan, J. Opt. Soc. Am. B 24, 538 (2007).

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

Shinriki, H.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

Sirutkaitis, V.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Skrebutenas, A.

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Szymanowski, H.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Wang, C. R.

Wang, Y. J.

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

Wang, Z.

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Wu, Q.

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Xu, C.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

Yuan, L.

Zabeida, O.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Zhai, T.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

Zhao, Y.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

Zhao, Y. A.

L. Yuan, Y. A. Zhao, G. Q. Shang, C. R. Wang, H. B. He, J. D. Shao, and Z. X. Fan, J. Opt. Soc. Am. B 24, 538 (2007).

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

Zhu, Y.

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

Acta Opt. Sin. (in Chinese)

P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).

Appl. Opt.

Appl. Surf. Sci.

Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).

Chinese J. Lasers (in Chinese)

X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).

IEEE Trans. Electron Devices

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

J. Opt. Soc. Am. B

Proc. SPIE

C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).

J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).

G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).

Thin Solid Films

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).

Vacuum

C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.