T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).

[CrossRef]

E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller polarimeter based on liquid crystal devices," Thin Solid Films 455-456, 120-123 (2004).

[CrossRef]

A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004).

[CrossRef]

X.-T. Huang and F. L. Terry, Jr., Erratum to "Spectroscopic ellipsometry and reflectometry from grating (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," [Thin Solid Films 455-456, 828-836 (2004)], Thin Solid Films 486, 339-346 (2004).

[CrossRef]

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

B. Kaplan, T. Novikova, A. De Martino, and B. Drévillon, "Characterization of bidimensional gratings by spectroscopic ellipsometry and angle-resolved Mueller polarimetry," Appl. Opt. 43, 1233-1240 (2004).

[CrossRef]
[PubMed]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998).

[CrossRef]

E. Compain and B. Drévillon, "High frequency modulation of the four states of polarization of light with a single phase modulator," Rev. Sci. Instrum. 69, 1574-1580 (1998).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).

[CrossRef]

M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).

[CrossRef]

G. E. Jellison, Jr., "Data analysis for spectroscopic ellipsometry," Thin Solid Films 234, 416-422 (1993).

[CrossRef]

V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).

K. Narahari Rao, Molecular Spectroscopy: Modern Research, Vol. II (Academic, 1976).

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 2nd ed. (North-Holland, 1986).

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 2nd ed. (North-Holland, 1986).

E. Compain and B. Drévillon, "High frequency modulation of the four states of polarization of light with a single phase modulator," Rev. Sci. Instrum. 69, 1574-1580 (1998).

[CrossRef]

P. C. Logofatu, S. A. Coulombe, B. K. Minhas, and J. R. McNeil, "Identity of the cross-reflection coefficients for symmetric surface-relief gratings," J. Opt. Soc. Am. A 16, 1108-1114 (1999).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998).

[CrossRef]

T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).

[CrossRef]

A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004).

[CrossRef]

B. Kaplan, T. Novikova, A. De Martino, and B. Drévillon, "Characterization of bidimensional gratings by spectroscopic ellipsometry and angle-resolved Mueller polarimetry," Appl. Opt. 43, 1233-1240 (2004).

[CrossRef]
[PubMed]

E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller polarimeter based on liquid crystal devices," Thin Solid Films 455-456, 120-123 (2004).

[CrossRef]

T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).

[CrossRef]

E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller polarimeter based on liquid crystal devices," Thin Solid Films 455-456, 120-123 (2004).

[CrossRef]

B. Kaplan, T. Novikova, A. De Martino, and B. Drévillon, "Characterization of bidimensional gratings by spectroscopic ellipsometry and angle-resolved Mueller polarimetry," Appl. Opt. 43, 1233-1240 (2004).

[CrossRef]
[PubMed]

A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004).

[CrossRef]

E. Compain and B. Drévillon, "High frequency modulation of the four states of polarization of light with a single phase modulator," Rev. Sci. Instrum. 69, 1574-1580 (1998).

[CrossRef]

V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).

A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004).

[CrossRef]

E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller polarimeter based on liquid crystal devices," Thin Solid Films 455-456, 120-123 (2004).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).

[CrossRef]

M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).

[CrossRef]

M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).

[CrossRef]

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

X.-T. Huang and F. L. Terry, Jr., Erratum to "Spectroscopic ellipsometry and reflectometry from grating (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," [Thin Solid Films 455-456, 828-836 (2004)], Thin Solid Films 486, 339-346 (2004).

[CrossRef]

G. E. Jellison, Jr., "Data analysis for spectroscopic ellipsometry," Thin Solid Films 234, 416-422 (1993).

[CrossRef]

A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004).

[CrossRef]

P. C. Logofatu, S. A. Coulombe, B. K. Minhas, and J. R. McNeil, "Identity of the cross-reflection coefficients for symmetric surface-relief gratings," J. Opt. Soc. Am. A 16, 1108-1114 (1999).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998).

[CrossRef]

P. C. Logofatu, S. A. Coulombe, B. K. Minhas, and J. R. McNeil, "Identity of the cross-reflection coefficients for symmetric surface-relief gratings," J. Opt. Soc. Am. A 16, 1108-1114 (1999).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998).

[CrossRef]

M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).

[CrossRef]

T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).

[CrossRef]

B. Kaplan, T. Novikova, A. De Martino, and B. Drévillon, "Characterization of bidimensional gratings by spectroscopic ellipsometry and angle-resolved Mueller polarimetry," Appl. Opt. 43, 1233-1240 (2004).

[CrossRef]
[PubMed]

T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).

[CrossRef]

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).

[CrossRef]

M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).

[CrossRef]

V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).

K. Narahari Rao, Molecular Spectroscopy: Modern Research, Vol. II (Academic, 1976).

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

M. Schubert, "Polarization-dependent optical parameters of arbitrarily anisotropic homogeneous layered systems," Phys. Rev. B 53, 4265-4274 (1996).

[CrossRef]

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

X.-T. Huang and F. L. Terry, Jr., Erratum to "Spectroscopic ellipsometry and reflectometry from grating (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," [Thin Solid Films 455-456, 828-836 (2004)], Thin Solid Films 486, 339-346 (2004).

[CrossRef]

V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).

V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998).

[CrossRef]

J. S. Tyo, "Design of optimal polarimeters: maximization of signal-to-noise ratio and minimization of systematic error," Appl. Opt. 41, 619-630 (2002).

[CrossRef]
[PubMed]

B. Kaplan, T. Novikova, A. De Martino, and B. Drévillon, "Characterization of bidimensional gratings by spectroscopic ellipsometry and angle-resolved Mueller polarimetry," Appl. Opt. 43, 1233-1240 (2004).

[CrossRef]
[PubMed]

T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).

[CrossRef]

L. Li, "Symmetries of cross-polarization diffraction coefficients of gratings," J. Opt. Soc. Am. A 17, 881-887 (2000).

[CrossRef]

P. C. Logofatu, S. A. Coulombe, B. K. Minhas, and J. R. McNeil, "Identity of the cross-reflection coefficients for symmetric surface-relief gratings," J. Opt. Soc. Am. A 16, 1108-1114 (1999).

[CrossRef]

L. Li, "Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings," J. Opt. Soc. Am. A 13, 1024-1035 (1996).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).

[CrossRef]

M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).

[CrossRef]

M. Schubert, "Polarization-dependent optical parameters of arbitrarily anisotropic homogeneous layered systems," Phys. Rev. B 53, 4265-4274 (1996).

[CrossRef]

A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004).

[CrossRef]

E. Compain and B. Drévillon, "High frequency modulation of the four states of polarization of light with a single phase modulator," Rev. Sci. Instrum. 69, 1574-1580 (1998).

[CrossRef]

A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004).

[CrossRef]

E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller polarimeter based on liquid crystal devices," Thin Solid Films 455-456, 120-123 (2004).

[CrossRef]

X.-T. Huang and F. L. Terry, Jr., Erratum to "Spectroscopic ellipsometry and reflectometry from grating (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," [Thin Solid Films 455-456, 828-836 (2004)], Thin Solid Films 486, 339-346 (2004).

[CrossRef]

G. E. Jellison, Jr., "Data analysis for spectroscopic ellipsometry," Thin Solid Films 234, 416-422 (1993).

[CrossRef]

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 2nd ed. (North-Holland, 1986).

K. Narahari Rao, Molecular Spectroscopy: Modern Research, Vol. II (Academic, 1976).

V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).