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Conferences > IPRSN > 2014 > IM3A > IM3A.4

Novel On-wafer Technique for Loss Characterization

E. Bitincka and M. K. Smit

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Abstract

We report for the first time an on-wafer propagation loss characterization technique that simplifies and speeds up the validation process. The small footprint (1.5 mm2) and high accuracy (±0.23 dB/cm) make this method ideal for PIC mass production.

© 2014 Optical Society of America

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