We present a study of the sidewall surface quality inside microchannels fabricated in fused silica glass by femtosecond laser pulses and chemical etching. Multiple combinations of laser exposure and etching solution parameters were examined. Results of scanning electron microscopy, atomic force microscopy, and optical reflection analyses of the surfaces are presented. The results obtained demonstrate the feasibility of optical quality surface fabrication, which in turn demonstrates the feasibility of fabricating complex integrated devices containing microfluidic channels and optical waveguides in the glass substrates.
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