We report on a novel aberration correction technique that uses the sequential combination of two different aberration measurement methods to correct for setup-induced and specimen-induced aberrations. The advantages of both methods are combined and, thus, the measurement time is strongly reduced without loss of accuracy. The technique is implemented using a spatial-light-modulator-based wide-field microscope without the need for additional components (e.g., a Shack–Hartmann sensor). The aberrations are measured without a reference object by directly using the specimen to be imaged. We demonstrate experimental results for technical as well as biological specimens.
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