August 2009
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Optimized circularly symmetric phase mask to extend the depth of focus
Conventional imaging systems typically have a fixed trade-off between depth of focus and resolution. In recent years pupil engineering has allowed the design of systems to improve the depth of focus. In this interesting and well-organized paper the authors use a novel approach, based on rational functions to design circularly symmetric phase masks that extend the depth of focus of imaging systems.
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Article Information
Optimized circularly symmetric phase mask to extend the depth of focus
Feng Zhou, Ran Ye, Guangwei Li, Haitao Zhang, and Dongsheng Wang
J. Opt. Soc. Am. A 26(8) 1889-1895 (2009) View: Abstract | HTML | PDF