Over the past decade, researchers have shattered the traditional view of the diffraction limit. Using new techniques, they have obtained resolution far smaller than the wavelength of light excitation or emission. Similar concepts are now being applied to photolithography, making it possible to create nanoscale features in a photoresist using visible or near-infrared light.

© 2011 Optical Society of America

PDF Article

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.