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Optica Publishing Group

Optical Materials Express Feature Issue

Phase Change Materials for Optics and Photonics

Submissions open: 1 April 2022
Submissions close: 1 May 2022

With a fast, dramatic, and reversible change in refractive index, phase change materials (PCMs) are a versatile platform for free-space and on-chip light modulation. The significant technical progress achieved in the last decade has led to an increasing number of optical devices with unprecedented performance, new alloys with superior optical properties, and a variety of techniques to control PCMs, thus attracting industry and funding agencies.

This feature issue will highlight recent advances in the development, characterization, control, and application of optical PCMs. Submissions ranging from the design of new PCMs with tailored optical properties and the development of techniques to control them, to emerging applications such as photonic computing, displays and holography, and tunable plasmonics are welcome. Theoretical studies and experimental demonstrations of device- and system-level applications, nano- and microfabrication techniques, and foundry-process integration will be also considered.

Topics to be covered include but are not limited to:

  • Novel optical phase change materials
  • Optical property characterization
  • Theory and modelling of PCM photonic responses and devices
  • Reconfigurable metasurfaces and plasmonic or polaritonic systems
  • Color filters and displays
  • Reprogrammable photonic integrated circuits
  • Non-von Neumann computing
  • Photonic memories
  • Novel switching mechanisms
  • PCM photonic devices/systems processing

Manuscripts must be prepared according to the usual guidelines for submission to Optical Materials Express and must be submitted online through the Prism submission system. When submitting, authors should specify that the manuscript is for the "Phase Change Materials for Optics and Photonics" feature issue (choose from the drop-down menu).

Feature Issue Guest Editors
Carlos Ríos, University of Maryland College Park, USA (Lead Editor)
Juejun Hu, Massachusetts Institute of Technology, USA
Ann-Katrin U. Michel, Sensirion AG and ETH Zürich, Switzerland
Arka Majumdar, University of Washington, USA
Linjie Zhou, Shanghai Jiao Tong University, China
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