Abstract

Aluminum oxyfluoride films were deposited by a combined HIPIMS/CFUBMS deposition technique with Al targets at room temperature. In order to obtain better optical and mechanical properties, films were investigated under different duty cycles and CF4 gas flow rates. The optical properties in deep ultraviolet range, microstructure, surface roughness, and crystalline structure of aluminum oxyfluoride films have been studied. The aluminum oxyfluoride films deposited with 45/255 duty cycle and 0.8 sccm CF4 had the lowest extinction coefficient (8 × 10−4) and the highest refractive index (1.72) at 193 nm. Additionally, aluminum oxyfluoride films revealed a dense and amorphous structure with 0.155 nm surface roughness.

© 2016 Optical Society of America

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  21. D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
    [Crossref]
  22. K. Miwa, N. Takada, and K. Sasaki, “Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas,” J. Vac. Sci. Technol. A 27, 831–835 (2009).

2014 (3)

2013 (1)

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

2012 (1)

J. Houska, J. Blazek, J. Rezek, and S. Proksova, “Overview of optical properties of Al2O3 films prepared by various techniques,” Thin Solid Films 520(16), 5405–5408 (2012).
[Crossref]

2011 (1)

2010 (1)

K. Sarakinos, J. Alami, and S. Konstantinidis, “High power pulsed magnetron sputtering: a review on scientific and engineering state of the art,” Surf. Coat. Tech. 204(11), 1661–1684 (2010).
[Crossref]

2009 (2)

K. Miwa, N. Takada, and K. Sasaki, “Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas,” J. Vac. Sci. Technol. A 27, 831–835 (2009).

B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]

2008 (2)

2006 (1)

2004 (2)

D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
[Crossref]

Y. Taki, “Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,” Vacuum 74(3-4), 431–435 (2004).
[Crossref]

2002 (2)

1999 (1)

R. D. Arnell and P. J. Kelly, “Recent advances in magnetron sputtering,” Surf. Coat. Tech. 112(1-3), 170–176 (1999).
[Crossref]

1998 (1)

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

1982 (1)

M. J. Kushner, “A kinetic study of plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas,” J. Appl. Phys. 53(4), 2923–2938 (1982).
[Crossref]

1976 (1)

J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” J. Phys. Educ. 9, 1002–1004 (1976).

Aki, R.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Alami, J.

K. Sarakinos, J. Alami, and S. Konstantinidis, “High power pulsed magnetron sputtering: a review on scientific and engineering state of the art,” Surf. Coat. Tech. 204(11), 1661–1684 (2010).
[Crossref]

Arnell, R. D.

R. D. Arnell and P. J. Kelly, “Recent advances in magnetron sputtering,” Surf. Coat. Tech. 112(1-3), 170–176 (1999).
[Crossref]

Balasa, I.

Blazek, J.

J. Houska, J. Blazek, J. Rezek, and S. Proksova, “Overview of optical properties of Al2O3 films prepared by various techniques,” Thin Solid Films 520(16), 5405–5408 (2012).
[Crossref]

Bosch, S.

Bouvet, M.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Char, K.

D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
[Crossref]

Chishima, T.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Commandré, M.

Douti, D. B.

Du, S.

Duparre, A.

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Duparré, A.

Ehlers, H.

Endo, I.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Etoh, K.

Eva, E.

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Ferré-Borrull, J.

Fillard, J. P.

J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” J. Phys. Educ. 9, 1002–1004 (1976).

Franke, C.

Fujii, T.

K. Iwase, P. C. Selvin, G. Sato, and T. Fujii, “Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmas,” J. Phys. D Appl. Phys. 35(16), 1934–1938 (2002).
[Crossref]

Gallais, L.

Gasiot, J.

J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” J. Phys. Educ. 9, 1002–1004 (1976).

Günster, S.

Ham, J. H.

D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
[Crossref]

Held, M.

Hoffman, R. M.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Houska, J.

J. Houska, J. Blazek, J. Rezek, and S. Proksova, “Overview of optical properties of Al2O3 films prepared by various techniques,” Thin Solid Films 520(16), 5405–5408 (2012).
[Crossref]

Hsiao, C.-N.

Iwase, K.

K. Iwase, P. C. Selvin, G. Sato, and T. Fujii, “Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmas,” J. Phys. D Appl. Phys. 35(16), 1934–1938 (2002).
[Crossref]

Jaing, C.-C.

B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]

Jakobs, S.

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Kaiser, N.

O. Stenzel, S. Wilbrandt, S. Du, C. Franke, N. Kaiser, A. Tünnermann, M. Mende, H. Ehlers, and M. Held, “Optical properties of UV-transparent aluminum oxide / aluminum fluoride mixture films prepared by plasma-ion assisted evaporation and ion beam sputtering,” Opt. Mater. Express 4(8), 1696–1707 (2014).
[Crossref]

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Kelly, P. J.

R. D. Arnell and P. J. Kelly, “Recent advances in magnetron sputtering,” Surf. Coat. Tech. 112(1-3), 170–176 (1999).
[Crossref]

Kim, D. S.

D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
[Crossref]

Kimura, H.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Kiriakidis, G.

Kishimoto, H.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Konstantinidis, S.

K. Sarakinos, J. Alami, and S. Konstantinidis, “High power pulsed magnetron sputtering: a review on scientific and engineering state of the art,” Surf. Coat. Tech. 204(11), 1661–1684 (2010).
[Crossref]

Kushner, M. J.

M. J. Kushner, “A kinetic study of plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas,” J. Appl. Phys. 53(4), 2923–2938 (1982).
[Crossref]

Lee, C.-C.

Liao, B.-H.

Liu, M.-C.

Manifacier, J. C.

J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” J. Phys. Educ. 9, 1002–1004 (1976).

Mann, K.

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Masetti, E.

Mende, M.

Miwa, K.

K. Miwa, N. Takada, and K. Sasaki, “Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas,” J. Vac. Sci. Technol. A 27, 831–835 (2009).

Momiyama, M.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Nishimoto, K.

Peiró, F.

Proksova, S.

J. Houska, J. Blazek, J. Rezek, and S. Proksova, “Overview of optical properties of Al2O3 films prepared by various techniques,” Thin Solid Films 520(16), 5405–5408 (2012).
[Crossref]

Quesnel, E.

Rezek, J.

J. Houska, J. Blazek, J. Rezek, and S. Proksova, “Overview of optical properties of Al2O3 films prepared by various techniques,” Thin Solid Films 520(16), 5405–5408 (2012).
[Crossref]

Ristau, D.

Sakurada, H.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Sarakinos, K.

K. Sarakinos, J. Alami, and S. Konstantinidis, “High power pulsed magnetron sputtering: a review on scientific and engineering state of the art,” Surf. Coat. Tech. 204(11), 1661–1684 (2010).
[Crossref]

Sasaki, K.

K. Miwa, N. Takada, and K. Sasaki, “Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas,” J. Vac. Sci. Technol. A 27, 831–835 (2009).

Sato, G.

K. Iwase, P. C. Selvin, G. Sato, and T. Fujii, “Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmas,” J. Phys. D Appl. Phys. 35(16), 1934–1938 (2002).
[Crossref]

Sekine, K.

Selvin, P. C.

K. Iwase, P. C. Selvin, G. Sato, and T. Fujii, “Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmas,” J. Phys. D Appl. Phys. 35(16), 1934–1938 (2002).
[Crossref]

Stenzel, O.

Suetsugu, A.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Takada, N.

K. Miwa, N. Takada, and K. Sasaki, “Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas,” J. Vac. Sci. Technol. A 27, 831–835 (2009).

Taki, Y.

Y. Taki, “Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,” Vacuum 74(3-4), 431–435 (2004).
[Crossref]

Thielsch, R.

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Tikhonravov, A.

Tünnermann, A.

Wilbrandt, S.

Yamada, A.

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

Yoshida, T.

Yu, Y. Y.

D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
[Crossref]

Appl. Opt. (5)

Appl. Phys. Lett. (1)

D. S. Kim, Y. Y. Yu, J. H. Ham, and K. Char, “Electrical characteristics and interface structure of magnetic tunnel junctions with aluminum oxyfluoride barrier,” Appl. Phys. Lett. 84(17), 3334–3336 (2004).
[Crossref]

J. Appl. Phys. (1)

M. J. Kushner, “A kinetic study of plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas,” J. Appl. Phys. 53(4), 2923–2938 (1982).
[Crossref]

J. Cell. Biochem. (1)

M. Momiyama, A. Suetsugu, H. Kimura, H. Kishimoto, R. Aki, A. Yamada, H. Sakurada, T. Chishima, M. Bouvet, I. Endo, and R. M. Hoffman, “Imaging the efficacy of UVC irradiation on superficial brain tumors and metastasis in live mice at the subcellular level,” J. Cell. Biochem. 114(2), 428–434 (2013).
[Crossref] [PubMed]

J. Phys. D Appl. Phys. (1)

K. Iwase, P. C. Selvin, G. Sato, and T. Fujii, “Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmas,” J. Phys. D Appl. Phys. 35(16), 1934–1938 (2002).
[Crossref]

J. Phys. Educ. (1)

J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” J. Phys. Educ. 9, 1002–1004 (1976).

J. Vac. Sci. Technol. A (1)

K. Miwa, N. Takada, and K. Sasaki, “Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas,” J. Vac. Sci. Technol. A 27, 831–835 (2009).

Opt. Express (2)

Opt. Mater. Express (1)

Opt. Rev. (1)

B.-H. Liao, C.-C. Lee, C.-C. Jaing, and M.-C. Liu, “Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas,” Opt. Rev. 16(4), 505–510 (2009).
[Crossref]

Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE (1)

A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, and E. Eva, “Surface finish and optical quality of CaF2 for UV litography applications,” Optical Microlithography XI, L.Van den Hove ed., Proc. SPIE 3334, 1048–1054 (1998).
[Crossref]

Surf. Coat. Tech. (2)

K. Sarakinos, J. Alami, and S. Konstantinidis, “High power pulsed magnetron sputtering: a review on scientific and engineering state of the art,” Surf. Coat. Tech. 204(11), 1661–1684 (2010).
[Crossref]

R. D. Arnell and P. J. Kelly, “Recent advances in magnetron sputtering,” Surf. Coat. Tech. 112(1-3), 170–176 (1999).
[Crossref]

Thin Solid Films (1)

J. Houska, J. Blazek, J. Rezek, and S. Proksova, “Overview of optical properties of Al2O3 films prepared by various techniques,” Thin Solid Films 520(16), 5405–5408 (2012).
[Crossref]

Vacuum (1)

Y. Taki, “Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,” Vacuum 74(3-4), 431–435 (2004).
[Crossref]

Other (2)

C. Zaczek, A. Pazidis, and H. Feldermann, in Optical Interference Coatings Topical Meeting, 2007 OSA Technical Digest Series (Optical Society of America 2007), FA1.

U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, and F. Voss, “Recent developments in industrial excimer laser technology,” in XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, D. R. Hall and H. J. Baker, eds., Proc. SPIE 3092, 485–492 (1997).
[Crossref]

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Figures (7)

Fig. 1
Fig. 1 Schematic diagram of sputtering deposition process.

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Fig. 2
Fig. 2 Transmittance spectra of Al2O3 thin films prepared with different RF power.

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Fig. 3
Fig. 3 (a) Transmittance spectra and (b) refractive index of Al2O3 thin films prepared with different HIPIMS on/off time.

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Fig. 4
Fig. 4 (a) Transmittance spectra of aluminum oxyfluoride films prepared with different CF4 gas flow rates and (b) refractive index and extinction coefficient of aluminum oxyfluoride films prepared with 0.8 sccm CF4.

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Fig. 5
Fig. 5 The evolution of refractive index and extinction coefficient of aluminum oxyfluoride films deposited with various CF4 flow rates at 248 nm.

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Fig. 6
Fig. 6 (a) XPS spectra over the entire energy range (0-1100 eV) and 6.(b) high-resolution XPS spectra of Al2p for the aluminum oxyfluoride films.

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Fig. 7
Fig. 7 AFM surface images and cross-sectional morphology of Al2O3 ((a) and (c)) and AlOxFy ((b) and (d).

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Equations (6)

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C F 4 + e − → C F 3 + + F + 2 e −
O + C F 3 → C O F 2 + F
O + C F 2 → C O + 2 F
O + C F 2 → C O F + F
O + C O F → C O 2 + F
O + C → C O

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