Formation of antireflective nanostructures on melamine and N,N´-di (1-naphthyl)-N,N´-diphenyl benzidine (NPB)

U. Schulz; C. Präfke; P. Munzert; C. Gödeker; N. Kaiser

doi:10.1364/OME.1.000101

Formation of antireflective nanostructures on melamine and N,N´-di (1-naphthyl)-N,N´-diphenyl benzidine (NPB)

U. Schulz, C. Präfke, P. Munzert, C. Gödeker, and N. Kaiser

Optical Materials Express
Vol. 1,
Issue 1,
pp. 101-107
(2011)
•https://doi.org/10.1364/OME.1.000101

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U. Schulz, C. Präfke, P. Munzert, C. Gödeker, and N. Kaiser, "Formation of antireflective nanostructures on melamine and N,N´-di (1-naphthyl)-N,N´-diphenyl benzidine (NPB)," Opt. Mater. Express 1, 101-107 (2011)

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Related Topics
Table of Contents Category
- Metamaterials
Optics & Photonics Topics
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The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Organic materials (160.4890)
- Antireflection coatings (310.1210)
- Subwavelength structures, nanostructures (310.6628)

About this Article
History
- Original Manuscript: January 26, 2011
- Revised Manuscript: February 16, 2011
- Manuscript Accepted: February 17, 2011
- Published: April 22, 2011

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Open Access

Abstract

Plasma-etched nanostructures are useful to provide antireflective properties to glass and plastic substrates. Organic compounds were deposited on glass substrates by thermal evaporation and etched by plasma emitted from an ion plasma source. A self-organized formation of surface structures takes place during etching of a layer of 1,3,5-Triazine-2,4,6-triamine (melamine). On the other hand, the surface of N,N´-di(1-naphthyl)-N,N´-diphenyl benzidine (NPB) remained smooth after etching. In this case, the structure formation was initiated by depositing a thin oxide layer on to the organic layer prior to the etching step. For both materials the etching process can be tailored to achieve antireflective properties over a desired wavelength range.

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OptiChar software, http://www.optilayer.com
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[Crossref]

2011 (1)

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

2009 (1)

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[Crossref]

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S. Wilbrandt, O. Stenzel, N. Kaiser, M. K. Trubetskov, and A. V. Tikhonravov, “In situ optical characterization and reengineering of interference coatings,” Appl. Opt. 47(13), C49–C54 (2008).
[Crossref] [PubMed]

2007 (2)

M. Chen, H. C. Chang, A. S. P. Chang, S.-Y. Lin, J.-Q. Xi, and E. F. Schubert, “Design of optical path for wide-angle gradient-index antireflection coatings,” Appl. Opt. 46(26), 6533–6538 (2007).
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U. Schulz, P. Munzert, R. Leitel, I. Wendling, N. Kaiser, and A. Tünnermann, “Antireflection of transparent polymers by advanced plasma etching procedures,” Opt. Express 15(20), 13108–13113 (2007).
[Crossref] [PubMed]

2004 (1)

A. Kaless, P. Munzert, U. Schulz, and N. Kaiser, “Nano-motheye antireflection pattern by plasma treatment of polymers,” Surf. Coat. Tech. 20, 58–61 (2004).

2002 (1)

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

2000 (2)

S. Jahromi and U. Moosheimer, “Oxygen barrier coatings based on supramolecular assembly of melamine,” Macromolecules 33(20), 7582–7587 (2000).
[Crossref]

G. Wu, Z. Denga, B. Fanb, D. Zhoub, and F. Zhang, “A novel route to control refractive index of sol-gel derived nano-porous silica films used as broadband antireflective coatings,” Mater. Sci. Eng. B 78(2-3), 135–139 (2000).
[Crossref]

1999 (2)

A. Gombert, W. Glaubitt, K. Rose, J. Dreibholz, B. Bläsi, A. Heinzel, D. Sporn, W. Döll, and V. Wittwer, “Subwavelength-structured antireflective surfaces on glass,” Thin Solid Films 351(1-2), 73–78 (1999).
[Crossref]

S. Walheim, E. Schäffer, J. Mlynek, and U. Steiner, “Nanophase-separated polymer films as high-performance antireflection coatings, ” Science 283(5401), 520–522 (1999).
[Crossref] [PubMed]

1996 (1)

S. A. Van Slyke, C. H. Chen, and C. W. Tang, “Organic electrolumi- nescent devices with improved stability,” Appl. Phys. Lett. 69(15), 2160–2162 (1996).
[Crossref]

1992 (1)

S. Pongratz and A. Zöller, “Plasma ion assisted deposition: A promising technique for optical coatings,” J. Vac. Sci. Technol. A 10(4), 1897–1904 (1992).
[Crossref]

1977 (1)

M. Minot, “The angular reflectance of single-layer gradient refractive-index films,” J. Opt. Soc. Am. 67(8), 1046–1050 (1977).
[Crossref]

1973 (1)

P. B. Clapham and M. C. Hutley, “Reduction of lens reflexion by the “Moth Eye” principle,” Nature 244(5414), 281–282 (1973).
[Crossref]

Acree, M.

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

Bauer, S.

Bläsi, B.

Bodea, M.

Chang, A. S. P.

Chang, H. C.

Chen, C. H.

S. A. Van Slyke, C. H. Chen, and C. W. Tang, “Organic electrolumi- nescent devices with improved stability,” Appl. Phys. Lett. 69(15), 2160–2162 (1996).
[Crossref]

Chen, M.

Clapham, P. B.

P. B. Clapham and M. C. Hutley, “Reduction of lens reflexion by the “Moth Eye” principle,” Nature 244(5414), 281–282 (1973).
[Crossref]

Denga, Z.

Dobrowolski, J. A.

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

Döll, W.

Dreibholz, J.

Fanb, B.

Glaubitt, W.

Gödeker, C.

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

Gombert, A.

Heinzel, A.

Hernandez-Sosa, G.

Hutley, M. C.

P. B. Clapham and M. C. Hutley, “Reduction of lens reflexion by the “Moth Eye” principle,” Nature 244(5414), 281–282 (1973).
[Crossref]

Irimia-Vladu, M.

Jahromi, S.

S. Jahromi and U. Moosheimer, “Oxygen barrier coatings based on supramolecular assembly of melamine,” Macromolecules 33(20), 7582–7587 (2000).
[Crossref]

Kaiser, N.

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

A. Kaless, P. Munzert, U. Schulz, and N. Kaiser, “Nano-motheye antireflection pattern by plasma treatment of polymers,” Surf. Coat. Tech. 20, 58–61 (2004).

Kaless, A.

A. Kaless, P. Munzert, U. Schulz, and N. Kaiser, “Nano-motheye antireflection pattern by plasma treatment of polymers,” Surf. Coat. Tech. 20, 58–61 (2004).

Leitel, R.

Lin, S.-Y.

Ma, P.

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

Marjanovic, N.

Minot, M.

M. Minot, “The angular reflectance of single-layer gradient refractive-index films,” J. Opt. Soc. Am. 67(8), 1046–1050 (1977).
[Crossref]

Mlynek, J.

S. Walheim, E. Schäffer, J. Mlynek, and U. Steiner, “Nanophase-separated polymer films as high-performance antireflection coatings, ” Science 283(5401), 520–522 (1999).
[Crossref] [PubMed]

Moosheimer, U.

S. Jahromi and U. Moosheimer, “Oxygen barrier coatings based on supramolecular assembly of melamine,” Macromolecules 33(20), 7582–7587 (2000).
[Crossref]

Munzert, P.

A. Kaless, P. Munzert, U. Schulz, and N. Kaiser, “Nano-motheye antireflection pattern by plasma treatment of polymers,” Surf. Coat. Tech. 20, 58–61 (2004).

Nüesch, F.

Poitras, D.

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

Pongratz, S.

S. Pongratz and A. Zöller, “Plasma ion assisted deposition: A promising technique for optical coatings,” J. Vac. Sci. Technol. A 10(4), 1897–1904 (1992).
[Crossref]

Präfke, C.

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

Ramil, A. M.

Rose, K.

Sariciftci, N. S.

Schäffer, E.

S. Walheim, E. Schäffer, J. Mlynek, and U. Steiner, “Nanophase-separated polymer films as high-performance antireflection coatings, ” Science 283(5401), 520–522 (1999).
[Crossref] [PubMed]

Schubert, E. F.

Schulz, U.

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

A. Kaless, P. Munzert, U. Schulz, and N. Kaiser, “Nano-motheye antireflection pattern by plasma treatment of polymers,” Surf. Coat. Tech. 20, 58–61 (2004).

Schwödiauer, R.

Sporn, D.

Steiner, U.

S. Walheim, E. Schäffer, J. Mlynek, and U. Steiner, “Nanophase-separated polymer films as high-performance antireflection coatings, ” Science 283(5401), 520–522 (1999).
[Crossref] [PubMed]

Stenzel, O.

Tang, C. W.

S. A. Van Slyke, C. H. Chen, and C. W. Tang, “Organic electrolumi- nescent devices with improved stability,” Appl. Phys. Lett. 69(15), 2160–2162 (1996).
[Crossref]

Tikhonravov, A. V.

Trubetskov, M. K.

Tünnermann, A.

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

Vakil, H.

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

Van Slyke, S. A.

S. A. Van Slyke, C. H. Chen, and C. W. Tang, “Organic electrolumi- nescent devices with improved stability,” Appl. Phys. Lett. 69(15), 2160–2162 (1996).
[Crossref]

Walheim, S.

S. Walheim, E. Schäffer, J. Mlynek, and U. Steiner, “Nanophase-separated polymer films as high-performance antireflection coatings, ” Science 283(5401), 520–522 (1999).
[Crossref] [PubMed]

Wendling, I.

Wilbrandt, S.

Wittwer, V.

Wu, G.

Xi, J.-Q.

Zhang, F.

Zhoub, D.

Zöller, A.

S. Pongratz and A. Zöller, “Plasma ion assisted deposition: A promising technique for optical coatings,” J. Vac. Sci. Technol. A 10(4), 1897–1904 (1992).
[Crossref]

Appl. Opt. (4)

J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41(16), 3075–3083 (2002).
[Crossref] [PubMed]

U. Schulz, C. Präfke, C. Gödeker, N. Kaiser, and A. Tünnermann, “Plasma-etched organic layers for antireflection purposes,” Appl. Opt. 50(9), C31–C35 (2011).
[Crossref]

Appl. Phys. Lett. (1)

S. A. Van Slyke, C. H. Chen, and C. W. Tang, “Organic electrolumi- nescent devices with improved stability,” Appl. Phys. Lett. 69(15), 2160–2162 (1996).
[Crossref]

J. Opt. Soc. Am. (1)

M. Minot, “The angular reflectance of single-layer gradient refractive-index films,” J. Opt. Soc. Am. 67(8), 1046–1050 (1977).
[Crossref]

J. Vac. Sci. Technol. A (1)

S. Pongratz and A. Zöller, “Plasma ion assisted deposition: A promising technique for optical coatings,” J. Vac. Sci. Technol. A 10(4), 1897–1904 (1992).
[Crossref]

Macromolecules (1)

S. Jahromi and U. Moosheimer, “Oxygen barrier coatings based on supramolecular assembly of melamine,” Macromolecules 33(20), 7582–7587 (2000).
[Crossref]

Mater. Sci. Eng. B (1)

Nature (1)

P. B. Clapham and M. C. Hutley, “Reduction of lens reflexion by the “Moth Eye” principle,” Nature 244(5414), 281–282 (1973).
[Crossref]

Opt. Express (1)

Org. Electron. (1)

Science (1)

S. Walheim, E. Schäffer, J. Mlynek, and U. Steiner, “Nanophase-separated polymer films as high-performance antireflection coatings, ” Science 283(5401), 520–522 (1999).
[Crossref] [PubMed]

Surf. Coat. Tech. (1)

A. Kaless, P. Munzert, U. Schulz, and N. Kaiser, “Nano-motheye antireflection pattern by plasma treatment of polymers,” Surf. Coat. Tech. 20, 58–61 (2004).

Thin Solid Films (1)

Other (2)

A. Macleod, Thin-Film Optical Filters, 3rd edition (Institute of Physics Publishing, 2001).

OptiChar software, http://www.optilayer.com

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Fig. 1 Chemical structure and melting temperature of N,N´-di(1-naphthyl)-N,N´-diphenyl benzidine (NPB) and 2,4,6-triamino-1,3,5-triazine (melamine).

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Fig. 2 SEM images of 200 nm melamine thin film on glass (a) prior to etching and after etching for (b) 60 s, (c) 160 s and (d) 200 s.

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Fig. 3 Left: detail of FTIR absorbance spectra of melamine measured before and after etching and, right: absorbance values at 3130 cm-1 (band of interacting NH groups [13]) as a function of etch time and the evaluation of the etch rate.

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Fig. 4 Transmission T and total losses (100- R + T) of a 300 nm melamine thin film before etching and after 100s etching (dashed lines) and after 200 s etching (dotted lines). The transmission of the uncoated B270 glass is shown for comparison.

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Fig. 5 Reflectance of etched melamine layers on glass including 30 nm silica top layer (without back side reflectance).The reflectance of the uncoated B270 glass is shown for comparison.

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Fig. 6 SEM images of a 270 nm NPB thin film on glass after coating with 4 nm TiO₂ and etching for (a) 60 s, (b) 180 s, (c) 240 s, and (d) 430 s.

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Fig. 7 Reflectance of etched NPB layers on glass without and with 36 nm silica top layer (without back side reflectance).The reflectance of the uncoated B270 glass is shown for comparison.

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Fig. 8 SEM images of structured melamine (a) and NPB (b) on silicon, viewing angle 45°.

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