Characterizing the tunable refractive index of vanadium dioxide

Marc Currie; Michael A. Mastro; Virginia D. Wheeler

doi:10.1364/OME.7.001697

Characterizing the tunable refractive index of vanadium dioxide

Marc Currie, Michael A. Mastro, and Virginia D. Wheeler

Optical Materials Express
Vol. 7,
Issue 5,
pp. 1697-1707
(2017)
•https://doi.org/10.1364/OME.7.001697

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Marc Currie, Michael A. Mastro, and Virginia D. Wheeler, "Characterizing the tunable refractive index of vanadium dioxide," Opt. Mater. Express 7, 1697-1707 (2017)

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Related Topics
Table of Contents Category
- Optical Materials
Optics & Photonics Topics
?

The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Optical materials (160.4670)
- Thermo-optical materials (160.6840)
- Thin films, optical properties (310.6860)

About this Article
History
- Original Manuscript: January 25, 2017
- Revised Manuscript: April 7, 2017
- Manuscript Accepted: April 7, 2017
- Published: April 26, 2017

Accessible

Open Access

Abstract

Vanadium dioxide undergoes a reversible metal-insulator phase change near 68°C. This transition is often recognized for its electronic properties; however, the concomitant change in optical properties is also attractive. One application is to exploit the optical properties within this transition region to control and tune the refractive index between its insulating and metallic states. To achieve this, we used atomic layer deposition to grow high-quality, low-temperature (≤150°C), ultrathin films of vanadium dioxide on sapphire substrates. Measurements of optical transmittance and reflectance as a function of temperature are then used to create wavelength and temperature dependent models of the complex optical refractive index. Our models create a foundation for developing vanadium dioxide as a tunable refractive index material.

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References

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|
Year
|
Author
|
Publication

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[Crossref] [PubMed]
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[Crossref]
A. S. Barker, H. W. Verleur, and H. J. Guggenheim, “Infrared optical properties of vanadium dioxide above and below the transition temperature,” Phys. Rev. Lett. 17(26), 1286–1289 (1966).
[Crossref]
S. M. Babulanam, T. S. Eriksson, G. A. Niklasson, and C. G. Granqvist, “Thermochromic VO2 films for energy-efficient windows,” Sol. Energy Mater. 16(5), 347–363 (1987).
[Crossref]
M. Benkahoul, M. Chaker, J. Margot, E. Haddad, R. Kruzelecky, B. Wong, W. Jamroz, and P. Poinas, “Thermochromic VO2 film deposited on Al with tunable thermal emissivity for space applications,” Sol. Energy Mater. Sol. Cells 95(12), 3504–3508 (2011).
[Crossref]
J. H. Park, J. M. Coy, T. S. Kasirga, C. Huang, Z. Fei, S. Hunter, and D. H. Cobden, “Measurement of a solid-state triple point at the metal-insulator transition in VO2,” Nature 500(7463), 431–434 (2013).
[Crossref] [PubMed]
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[Crossref]
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R. M. Wentzcovitch, W. W. Schulz, and P. B. Allen, “VO2: Peierls or Mott-Hubbard? A view from band theory,” Phys. Rev. Lett. 72(21), 3389–3392 (1994).
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H. W. Verleur, A. S. Barker, and C. N. Berglund, “Optical Properties of VO2 between 0.25 and 5 eV,” Phys. Rev. 172(3), 788–798 (1968).
[Crossref]
F. Guinneton, L. Sauques, J.-C. Valmalette, F. Cros, and J.-R. Gavarri, “Optimized infrared switching properties in thermochromic vanadium dioxide thin films: role of deposition process and microstructure,” Thin Solid Films 446(2), 287–295 (2004).
[Crossref]
A. Lafort, H. Kebaili, S. Goumri-Said, O. Deparis, R. Cloots, J. De Coninck, M. Voué, F. Mirabella, F. Maseri, and S. Lucas, “Optical properties of thermochromic VO2 thin films on stainless steel: Experimental and theoretical studies,” Thin Solid Films 519(10), 3283–3287 (2011).
[Crossref]
M. M. Qazilbash, M. Brehm, B.-G. Chae, P.-C. Ho, G. O. Andreev, B.-J. Kim, S. J. Yun, A. V. Balatsky, M. B. Maple, F. Keilmann, H.-T. Kim, and D. N. Basov, “Mott transition in VO2 revealed by infrared spectroscopy and nano-imaging,” Science 318(5857), 1750–1753 (2007).
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S. Cueff, D. Li, Y. Zhou, F. J. Wong, J. A. Kurvits, S. Ramanathan, and R. Zia, “Dynamic control of light emission faster than the lifetime limit using VO2 phase-change,” Nat. Commun. 6, 8636 (2015).
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[Crossref] [PubMed]
L. A. Sweatlock and K. Diest, “Vanadium dioxide based plasmonic modulators,” Opt. Express 20(8), 8700–8709 (2012).
[Crossref] [PubMed]
M. J. Dicken, K. Aydin, I. M. Pryce, L. A. Sweatlock, E. M. Boyd, S. Walavalkar, J. Ma, and H. A. Atwater, “Frequency tunable near-infrared metamaterials based on VO2 phase transition,” Opt. Express 17(20), 18330–18339 (2009).
[Crossref] [PubMed]
H. N. S. Krishnamoorthy, Y. Zhou, S. Ramanathan, E. Narimanov, and V. M. Menon, “Tunable hyperbolic metamaterials utilizing phase change heterostructures,” Appl. Phys. Lett. 104(12), 121101 (2014).
[Crossref]
S. K. Earl, T. D. James, T. J. Davis, J. C. McCallum, R. E. Marvel, R. F. Haglund, and A. Roberts, “Tunable optical antennas enabled by the phase transition in vanadium dioxide,” Opt. Express 21(22), 27503–27508 (2013).
[Crossref] [PubMed]
M. A. Kats, D. Sharma, J. Lin, P. Genevet, R. Blanchard, Z. Yang, M. M. Qazilbash, D. N. Basov, S. Ramanathan, and F. Capasso, “Ultra-thin perfect absorber employing a tunable phase change material,” Appl. Phys. Lett. 101(22), 221101 (2012).
[Crossref]
P. A. Premkumar, M. Toeller, I. P. Radu, C. Adelmann, M. Schaekers, J. Meersschaut, T. Conard, and S. V. Elshocht, “Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors,” ECS J. Solid State Sci. Technol. 1(4), P169–P174 (2012).
[Crossref]
G. Rampelberg, D. Deduytsche, B. De Schutter, P. A. Premkumar, M. Toeller, M. Schaekers, K. Martens, I. Radu, and C. Detavernier, “Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition,” Thin Solid Films 550, 59–64 (2014).
[Crossref]
A. P. Peter, K. Martens, G. Rampelberg, M. Toeller, J. M. Ablett, J. Meersschaut, D. Cuypers, A. Franquet, C. Detavernier, J.-P. Rueff, M. Schaekers, S. Van Elshocht, M. Jurczak, C. Adelmann, and I. P. Radu, “Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control,” Adv. Funct. Mater. 25(5), 679–686 (2015).
[Crossref]
M. A. Kats, R. Blanchard, S. Zhang, P. Genevet, C. Ko, S. Ramanathan, and F. Capasso, “Vanadium dioxide as a natural disordered metamaterial: perfect thermal emission and large broadband negative differential thermal emittance,” Phys. Rev. X 3(4), 041004 (2013).
[Crossref]
D. Fu, K. Liu, T. Tao, K. Lo, C. Cheng, B. Liu, R. Zhang, H. A. Bechtel, and J. Wu, “Comprehensive study of the metal-insulator transition in pulsed laser deposited epitaxial VO2 thin films,” J. Appl. Phys. 113(4), 043707 (2013).
[Crossref]
P. Jin, K. Yoshimura, and S. Tanemura, “Dependence of microstructure and thermochromism on substrate temperature for sputter-deposited VO2 epitaxial films,” J. Vac. Sci. Technol. Vac. Surf. Films 15(3), 1113–1117 (1997).
[Crossref]
J. M. Atkin, S. Berweger, E. K. Chavez, M. B. Raschke, J. Cao, W. Fan, and J. Wu, “Strain and temperature dependence of the insulating phases of VO2 near the metal-insulator transition,” Phys. Rev. B 85(2), 020101 (2012).
[Crossref]
G. I. Petrov, V. V. Yakovlev, and J. Squier, “Raman microscopy analysis of phase transformation mechanisms in vanadium dioxide,” Appl. Phys. Lett. 81(6), 1023–1025 (2002).
[Crossref]
M. Tazawa, P. Jin, and S. Tanemura, “Optical constants of V1-xWxO2 Films,” Appl. Opt. 37(10), 1858–1861 (1998).
[Crossref] [PubMed]
E. N. Fuls, D. H. Hensler, and A. R. Ross, “Reactively sputtered vanadium dioxide thin films,” Appl. Phys. Lett. 10(7), 199–201 (1967).
[Crossref]
A. Joushaghani, “Micro- and Nano-scale Optoelectronic Devices Using Vanadium Dioxide,” Thesis (2014).
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[Crossref] [PubMed]
N. Davila, R. Cabrera, and N. Sepulveda, “Programming and projection of near IR images using films,” IEEE Photonics Technol. Lett. 24(20), 1830–1833 (2012).
[Crossref]

2015 (2)

S. Cueff, D. Li, Y. Zhou, F. J. Wong, J. A. Kurvits, S. Ramanathan, and R. Zia, “Dynamic control of light emission faster than the lifetime limit using VO2 phase-change,” Nat. Commun. 6, 8636 (2015).
[Crossref] [PubMed]

A. P. Peter, K. Martens, G. Rampelberg, M. Toeller, J. M. Ablett, J. Meersschaut, D. Cuypers, A. Franquet, C. Detavernier, J.-P. Rueff, M. Schaekers, S. Van Elshocht, M. Jurczak, C. Adelmann, and I. P. Radu, “Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control,” Adv. Funct. Mater. 25(5), 679–686 (2015).
[Crossref]

2014 (2)

H. N. S. Krishnamoorthy, Y. Zhou, S. Ramanathan, E. Narimanov, and V. M. Menon, “Tunable hyperbolic metamaterials utilizing phase change heterostructures,” Appl. Phys. Lett. 104(12), 121101 (2014).
[Crossref]

G. Rampelberg, D. Deduytsche, B. De Schutter, P. A. Premkumar, M. Toeller, M. Schaekers, K. Martens, I. Radu, and C. Detavernier, “Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition,” Thin Solid Films 550, 59–64 (2014).
[Crossref]

2013 (5)

M. A. Kats, R. Blanchard, S. Zhang, P. Genevet, C. Ko, S. Ramanathan, and F. Capasso, “Vanadium dioxide as a natural disordered metamaterial: perfect thermal emission and large broadband negative differential thermal emittance,” Phys. Rev. X 3(4), 041004 (2013).
[Crossref]

D. Fu, K. Liu, T. Tao, K. Lo, C. Cheng, B. Liu, R. Zhang, H. A. Bechtel, and J. Wu, “Comprehensive study of the metal-insulator transition in pulsed laser deposited epitaxial VO2 thin films,” J. Appl. Phys. 113(4), 043707 (2013).
[Crossref]

J. H. Park, J. M. Coy, T. S. Kasirga, C. Huang, Z. Fei, S. Hunter, and D. H. Cobden, “Measurement of a solid-state triple point at the metal-insulator transition in VO2,” Nature 500(7463), 431–434 (2013).
[Crossref] [PubMed]

Z. Matjasec, S. Campelj, and D. Donlagic, “All-optical, thermo-optical path length modulation based on the vanadium-doped fibers,” Opt. Express 21(10), 11794–11807 (2013).
[Crossref] [PubMed]

S. K. Earl, T. D. James, T. J. Davis, J. C. McCallum, R. E. Marvel, R. F. Haglund, and A. Roberts, “Tunable optical antennas enabled by the phase transition in vanadium dioxide,” Opt. Express 21(22), 27503–27508 (2013).
[Crossref] [PubMed]

2012 (6)

M. A. Kats, D. Sharma, J. Lin, P. Genevet, R. Blanchard, Z. Yang, M. M. Qazilbash, D. N. Basov, S. Ramanathan, and F. Capasso, “Ultra-thin perfect absorber employing a tunable phase change material,” Appl. Phys. Lett. 101(22), 221101 (2012).
[Crossref]

P. A. Premkumar, M. Toeller, I. P. Radu, C. Adelmann, M. Schaekers, J. Meersschaut, T. Conard, and S. V. Elshocht, “Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors,” ECS J. Solid State Sci. Technol. 1(4), P169–P174 (2012).
[Crossref]

J. M. Atkin, S. Berweger, E. K. Chavez, M. B. Raschke, J. Cao, W. Fan, and J. Wu, “Strain and temperature dependence of the insulating phases of VO2 near the metal-insulator transition,” Phys. Rev. B 85(2), 020101 (2012).
[Crossref]

L. A. Sweatlock and K. Diest, “Vanadium dioxide based plasmonic modulators,” Opt. Express 20(8), 8700–8709 (2012).
[Crossref] [PubMed]

M. Nakano, K. Shibuya, D. Okuyama, T. Hatano, S. Ono, M. Kawasaki, Y. Iwasa, and Y. Tokura, “Collective bulk carrier delocalization driven by electrostatic surface charge accumulation,” Nature 487(7408), 459–462 (2012).
[Crossref] [PubMed]

N. Davila, R. Cabrera, and N. Sepulveda, “Programming and projection of near IR images using films,” IEEE Photonics Technol. Lett. 24(20), 1830–1833 (2012).
[Crossref]

2011 (2)

A. Lafort, H. Kebaili, S. Goumri-Said, O. Deparis, R. Cloots, J. De Coninck, M. Voué, F. Mirabella, F. Maseri, and S. Lucas, “Optical properties of thermochromic VO2 thin films on stainless steel: Experimental and theoretical studies,” Thin Solid Films 519(10), 3283–3287 (2011).
[Crossref]

M. Benkahoul, M. Chaker, J. Margot, E. Haddad, R. Kruzelecky, B. Wong, W. Jamroz, and P. Poinas, “Thermochromic VO2 film deposited on Al with tunable thermal emissivity for space applications,” Sol. Energy Mater. Sol. Cells 95(12), 3504–3508 (2011).
[Crossref]

2010 (1)

R. M. Briggs, I. M. Pryce, and H. A. Atwater, “Compact silicon photonic waveguide modulator based on the vanadium dioxide metal-insulator phase transition,” Opt. Express 18(11), 11192–11201 (2010).
[Crossref] [PubMed]

2009 (1)

M. J. Dicken, K. Aydin, I. M. Pryce, L. A. Sweatlock, E. M. Boyd, S. Walavalkar, J. Ma, and H. A. Atwater, “Frequency tunable near-infrared metamaterials based on VO2 phase transition,” Opt. Express 17(20), 18330–18339 (2009).
[Crossref] [PubMed]

2007 (2)

M. M. Qazilbash, M. Brehm, B.-G. Chae, P.-C. Ho, G. O. Andreev, B.-J. Kim, S. J. Yun, A. V. Balatsky, M. B. Maple, F. Keilmann, H.-T. Kim, and D. N. Basov, “Mott transition in VO2 revealed by infrared spectroscopy and nano-imaging,” Science 318(5857), 1750–1753 (2007).
[Crossref] [PubMed]

H. Kakiuchida, P. Jin, S. Nakao, and M. Tazawa, “Optical properties of vanadium dioxide film during semiconductive–metallic phase transition,” Jpn. J. Appl. Phys. 46(5), L113–L116 (2007).
[Crossref]

2004 (1)

F. Guinneton, L. Sauques, J.-C. Valmalette, F. Cros, and J.-R. Gavarri, “Optimized infrared switching properties in thermochromic vanadium dioxide thin films: role of deposition process and microstructure,” Thin Solid Films 446(2), 287–295 (2004).
[Crossref]

2002 (1)

G. I. Petrov, V. V. Yakovlev, and J. Squier, “Raman microscopy analysis of phase transformation mechanisms in vanadium dioxide,” Appl. Phys. Lett. 81(6), 1023–1025 (2002).
[Crossref]

1997 (1)

P. Jin, K. Yoshimura, and S. Tanemura, “Dependence of microstructure and thermochromism on substrate temperature for sputter-deposited VO2 epitaxial films,” J. Vac. Sci. Technol. Vac. Surf. Films 15(3), 1113–1117 (1997).
[Crossref]

1994 (1)

R. M. Wentzcovitch, W. W. Schulz, and P. B. Allen, “VO2: Peierls or Mott-Hubbard? A view from band theory,” Phys. Rev. Lett. 72(21), 3389–3392 (1994).
[Crossref] [PubMed]

1987 (1)

S. M. Babulanam, T. S. Eriksson, G. A. Niklasson, and C. G. Granqvist, “Thermochromic VO2 films for energy-efficient windows,” Sol. Energy Mater. 16(5), 347–363 (1987).
[Crossref]

1985 (1)

J. Zaanen, G. A. Sawatzky, and J. W. Allen, “Band gaps and electronic structure of transition-metal compounds,” Phys. Rev. Lett. 55(4), 418–421 (1985).
[Crossref] [PubMed]

1968 (1)

H. W. Verleur, A. S. Barker, and C. N. Berglund, “Optical Properties of VO2 between 0.25 and 5 eV,” Phys. Rev. 172(3), 788–798 (1968).
[Crossref]

1967 (1)

E. N. Fuls, D. H. Hensler, and A. R. Ross, “Reactively sputtered vanadium dioxide thin films,” Appl. Phys. Lett. 10(7), 199–201 (1967).
[Crossref]

1966 (1)

A. S. Barker, H. W. Verleur, and H. J. Guggenheim, “Infrared optical properties of vanadium dioxide above and below the transition temperature,” Phys. Rev. Lett. 17(26), 1286–1289 (1966).
[Crossref]

1959 (1)

F. J. Morin, “Oxides which show a metal-to-insulator transition at the neel temperature,” Phys. Rev. Lett. 3(1), 34–36 (1959).
[Crossref]

1949 (1)

N. F. Mott, “The basis of the electron theory of metals, with special reference to the transition metals,” Proc. Phys. Soc. A 62(7), 416–422 (1949).
[Crossref]

Ablett, J. M.

Adelmann, C.

Allen, J. W.

J. Zaanen, G. A. Sawatzky, and J. W. Allen, “Band gaps and electronic structure of transition-metal compounds,” Phys. Rev. Lett. 55(4), 418–421 (1985).
[Crossref] [PubMed]

Allen, P. B.

R. M. Wentzcovitch, W. W. Schulz, and P. B. Allen, “VO2: Peierls or Mott-Hubbard? A view from band theory,” Phys. Rev. Lett. 72(21), 3389–3392 (1994).
[Crossref] [PubMed]

Andreev, G. O.

Atkin, J. M.

Atwater, H. A.

Aydin, K.

Babulanam, S. M.

S. M. Babulanam, T. S. Eriksson, G. A. Niklasson, and C. G. Granqvist, “Thermochromic VO2 films for energy-efficient windows,” Sol. Energy Mater. 16(5), 347–363 (1987).
[Crossref]

Balatsky, A. V.

Barker, A. S.

H. W. Verleur, A. S. Barker, and C. N. Berglund, “Optical Properties of VO2 between 0.25 and 5 eV,” Phys. Rev. 172(3), 788–798 (1968).
[Crossref]

Basov, D. N.

Bechtel, H. A.

Benkahoul, M.

Berglund, C. N.

H. W. Verleur, A. S. Barker, and C. N. Berglund, “Optical Properties of VO2 between 0.25 and 5 eV,” Phys. Rev. 172(3), 788–798 (1968).
[Crossref]

Berweger, S.

Blanchard, R.

Boyd, E. M.

Brehm, M.

Briggs, R. M.

Cabrera, R.

N. Davila, R. Cabrera, and N. Sepulveda, “Programming and projection of near IR images using films,” IEEE Photonics Technol. Lett. 24(20), 1830–1833 (2012).
[Crossref]

Campelj, S.

Z. Matjasec, S. Campelj, and D. Donlagic, “All-optical, thermo-optical path length modulation based on the vanadium-doped fibers,” Opt. Express 21(10), 11794–11807 (2013).
[Crossref] [PubMed]

Cao, J.

Capasso, F.

Chae, B.-G.

Chaker, M.

Chavez, E. K.

Cheng, C.

Cloots, R.

Cobden, D. H.

Conard, T.

Coy, J. M.

Cros, F.

Cueff, S.

Cuypers, D.

Davila, N.

N. Davila, R. Cabrera, and N. Sepulveda, “Programming and projection of near IR images using films,” IEEE Photonics Technol. Lett. 24(20), 1830–1833 (2012).
[Crossref]

Davis, M. K.

M. K. Davis and M. J. F. Digonnet, “Measurements of thermal effects in fibers doped with cobalt and vanadium,” J. Lightwave Technol. 18(2), 161–165 (2000).
[Crossref]

Davis, T. J.

De Coninck, J.

De Schutter, B.

Deduytsche, D.

Deparis, O.

Detavernier, C.

Dicken, M. J.

Diest, K.

L. A. Sweatlock and K. Diest, “Vanadium dioxide based plasmonic modulators,” Opt. Express 20(8), 8700–8709 (2012).
[Crossref] [PubMed]

Digonnet, M. J. F.

M. K. Davis and M. J. F. Digonnet, “Measurements of thermal effects in fibers doped with cobalt and vanadium,” J. Lightwave Technol. 18(2), 161–165 (2000).
[Crossref]

Donlagic, D.

Z. Matjasec, S. Campelj, and D. Donlagic, “All-optical, thermo-optical path length modulation based on the vanadium-doped fibers,” Opt. Express 21(10), 11794–11807 (2013).
[Crossref] [PubMed]

Earl, S. K.

Elshocht, S. V.

Eriksson, T. S.

S. M. Babulanam, T. S. Eriksson, G. A. Niklasson, and C. G. Granqvist, “Thermochromic VO2 films for energy-efficient windows,” Sol. Energy Mater. 16(5), 347–363 (1987).
[Crossref]

Fan, W.

Fei, Z.

Franquet, A.

Fu, D.

Fuls, E. N.

E. N. Fuls, D. H. Hensler, and A. R. Ross, “Reactively sputtered vanadium dioxide thin films,” Appl. Phys. Lett. 10(7), 199–201 (1967).
[Crossref]

Gavarri, J.-R.

Genevet, P.

Goumri-Said, S.

Granqvist, C. G.

S. M. Babulanam, T. S. Eriksson, G. A. Niklasson, and C. G. Granqvist, “Thermochromic VO2 films for energy-efficient windows,” Sol. Energy Mater. 16(5), 347–363 (1987).
[Crossref]

Guggenheim, H. J.

Guinneton, F.

Haddad, E.

Haglund, R. F.

Hatano, T.

Hensler, D. H.

E. N. Fuls, D. H. Hensler, and A. R. Ross, “Reactively sputtered vanadium dioxide thin films,” Appl. Phys. Lett. 10(7), 199–201 (1967).
[Crossref]

Ho, P.-C.

Huang, C.

Hunter, S.

Iwasa, Y.

James, T. D.

Jamroz, W.

Jin, P.

M. Tazawa, P. Jin, and S. Tanemura, “Optical constants of V1-xWxO2 Films,” Appl. Opt. 37(10), 1858–1861 (1998).
[Crossref] [PubMed]

Jurczak, M.

Kakiuchida, H.

Kasirga, T. S.

Kats, M. A.

Kawasaki, M.

Kebaili, H.

Keilmann, F.

Kim, B.-J.

Kim, H.-T.

Ko, C.

Konovalova, O. P.

Krishnamoorthy, H. N. S.

Kruzelecky, R.

Kurvits, J. A.

Lafort, A.

Li, D.

Lin, J.

Liu, B.

Liu, K.

Lo, K.

Lucas, S.

Ma, J.

Maple, M. B.

Margot, J.

Martens, K.

Marvel, R. E.

Maseri, F.

Matjasec, Z.

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Appl. Opt. (1)

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Phys. Rev. B (1)

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Science (1)

Sol. Energy Mater. (1)

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Sol. Energy Mater. Sol. Cells (1)

Thin Solid Films (3)

Other (1)

A. Joushaghani, “Micro- and Nano-scale Optoelectronic Devices Using Vanadium Dioxide,” Thesis (2014).

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Fig. 1 (a) Atomic force microscopy of our VO₂ shows crystal grain sizes on the order of 20-40nm and an RMS roughness of 3.2nm. (b) Raman spectroscopy verifies the quality of the crystals and that at room temperature they exhibit the monoclinic VO₂ phase.

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Fig. 2 Spectral (a) transmittance and (b) reflectance of VO₂ on c-plane Al₂O₃ changes monotonically as a function of temperature from 24 to 90°C (arrows indicate direction of increasing temperature). (c) The change in transmittance (T – T₀)/ T₀ and (d) the change in reflectance (R – R₀)/ R₀ highlight temperature dependent changes of VO₂ by comparing to their value at room temperature (T₀ and R₀). The inset in (b) shows the change in transmittance near 2000 nm versus temperature to reveal a transition temperature of 61°C.

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Fig. 3 (a) The spectral absorbance of VO₂ changes as a function of temperature (from 24 to 90 °C) with arrow indicating increasing temperature, as calculated from the transmittance and reflectance data. (b) The spectral absorptance normalized to the room temperature value shows the changing characteristics of VO₂ with temperature and reveals subtle behavior near 500 nm.

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Fig. 4 A series of complex oscillators are used to model the optical permittivity of VO₂ in both the metallic (red lines) and insulating (black lines) phases. Both (a) two- and (b) three-oscillator models (solid lines) offer reasonable fits to the transmittance, reflectance, and absorptance data (open circles), however, the three-term oscillator model provides a better fit in the visible region.

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Fig. 5 Complex permittivity (a and c) and refractive index (b and d) from our model of VO₂ in the insulating (a and b) and metallic phases (c and d). The plots compare our model (solid lines) with previous results for VO₂ films grown by other techniques: sputtered [11,32,34]; and pulsed laser deposition [18,20].

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Fig. 6 A temperature-tunable refractive index model was created for VO₂. The open circles in the plot are the measured transmittance, reflectance, and absorptance at various temperatures, while the solid lines are the predicted values from our temperature- and wavelength-dependent model of VO₂.

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Tables (1)

Table 1 – Parameters for the two- and three-oscillator models of the permittivity of VO₂ in its metallic and insulating phases

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Equations (1)

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ε {E} = ε_{\infty} + \sum_{n} \frac{A_{n}}{(E_{n}^{2} - E^{2}) - i E B_{n}}

	ε_∞		osc. 1	osc. 2	osc. 3
Insulating
2-term model	3.4	E_n	3.8	1.15
		A_n	33	2.1
		B_n	1.4	1.28
3-term model	3.9	E_n	3.49	3.24	1.25
		A_n	5.9	12.8	2.9
		B_n	<<1	1.06	1.59
Metallic
2-term model	4.5	E_n	3.2	0.59
		A_n	12.7	5.3
		B_n	1.08	1.0
3-term model	3.3	E_n	3.61	3.15	0.58
		A_n	9.65	11.5	5.6
		B_n	<<1	1.08	1.04

Abstract

References

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