Abstract

Colored semi-transparent Cu-Si oxide thin films have been prepared by reactive magnetron sputtering from a single cathode of copper-silicon composition. Thin films of different composition and optical response were obtained by changing process parameters like the relative amount of copper in the target and the O2/Ar mixture of the reactive plasma gas. The film characteristics were analyzed by several techniques. Their optical properties (refractive index, absorption coefficient, color) have been correlated with the process parameters used in the film preparation as well as with the film stoichiometry and chemistry.

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    [CrossRef]
  3. C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
    [CrossRef]
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  5. B. Balamurugan and B. R. Mehta, “Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation,” Thin Solid Films396(1-2), 90–96 (2001).
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    [CrossRef]
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    [CrossRef]
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  30. R. Fernandez-Serrano, A. Vilajoana-Mas, J.C. Dürsteler-López, J. Gil-Rostra, F. Yubero-Valencia, A.R. González-Elipe, “Polymer lens comprising a hardening layer, and absorbent layer, and a interferential multilayer and corresponding method,” PCT/ES2010/000100.
  31. F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
    [CrossRef]
  32. F. Yubero, A. Stabel, and A. R. González-Elipe, “Optical properties and electron spectroscopy characterization of AlxTiyOz thin films,” J. Vac. Sci. Technol. A16(6), 3477–3482 (1998).
    [CrossRef]

2010 (1)

M. Arbab and J. J. Finley, “Glass in architecture,” Int. J. Appl. Glass Sci.1(1), 118–129 (2010).
[CrossRef]

2008 (1)

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

2007 (2)

J. Pierson, E. Duverger, and G. Banakh, “Experimental and theoretical contributions to the determination of optical properties of synthetic paramelaconite,” J. Solid State Chem.180(3), 968–973 (2007).
[CrossRef]

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

2006 (4)

A. S. Reddy, G. V. Rao, S. Uthanna, and P. S. Reddy, “Structural and optical studies on dc reactive magnetron sputtered Cu2O films,” Mater. Lett.60(13-14), 1617–1621 (2006).
[CrossRef]

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

G. Papadimitropoulos, N. Vourdas, V. Vamvakas, and D. Davazoglou, “Optical and structural properties of copper oxide thin films grown by oxidation of metal layers,” Thin Solid Films515(4), 2428–2432 (2006).
[CrossRef]

2005 (1)

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

2002 (1)

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

2001 (2)

C. M. Parler, J. A. Ritter, and M. D. Amiridis, “Infrared spectroscopic study of sol–gel derived mixed-metal oxides,” J. Non-Cryst. Solids279(2-3), 119–125 (2001).
[CrossRef]

B. Balamurugan and B. R. Mehta, “Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation,” Thin Solid Films396(1-2), 90–96 (2001).
[CrossRef]

2000 (1)

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

1999 (1)

I. Nakai, C. Numako, H. Hosono, and K. Yamasaki, “Origin of the red color of satsuma copper-ruby glass as determined by EXAFS and optical absorption spectroscopy,” J. Am. Ceram. Soc.82(3), 689–695 (1999).
[CrossRef]

1998 (2)

G. Moretti, “Auger parameter and Wagner plot in the characterization of chemical states by X-ray photoelectron spectroscopy: a review,” J. Electron Spectrosc. Relat. Phenom.95(2-3), 95–144 (1998).
[CrossRef]

F. Yubero, A. Stabel, and A. R. González-Elipe, “Optical properties and electron spectroscopy characterization of AlxTiyOz thin films,” J. Vac. Sci. Technol. A16(6), 3477–3482 (1998).
[CrossRef]

1996 (3)

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

T. Akai, H. Yamanaka, and H. Wakabayashi, “Preparation of copper-ruby glasses by sputtering: the effect of atmosphere on the growth of copper particles,” J. Am. Ceram. Soc.79(4), 859–864 (1996).
[CrossRef]

C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
[CrossRef]

1995 (1)

B. Lefez, R. Souchet, K. Kartouni, and M. Lenglet, “Infrared reflection study of CuO in thin oxide films,” Thin Solid Films268(1-2), 45–48 (1995).
[CrossRef]

1988 (1)

M. G. Ferreira da Silva and J. M. Fernandez-Navarro, “Colour of silicate sol-gel glasses containing CuO,” J. Non-Cryst. Solids100(1-3), 447–452 (1988).
[CrossRef]

1987 (1)

A. E. Rakhshani, “Measurement of dispersion in electrodeposited Cu2O,” J. Appl. Phys.62(4), 1528–1529 (1987).
[CrossRef]

1986 (1)

A. Forouhi and I. Bloomer, “Optical dispersion relations for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B34(10), 7018–7026 (1986).
[CrossRef]

1979 (2)

V. F. Drobny and D. L. Pulfrey, “Properties of reactively-sputtered copper oxide thin films,” Thin Solid Films61(1), 89–98 (1979).
[CrossRef]

M. Scrocco, “Satellite structure in the x-ray photoelectron spectra of CuO Cu2O,” Chem. Phys. Lett.63(1), 52–56 (1979).
[CrossRef]

1975 (1)

C. D. Wagner, “Chemical shifts of Auger lines, and the Auger parameter,” Faraday Discuss. Chem. Soc.60, 291–300 (1975).
[CrossRef]

1963 (1)

H. L. Smith and A. J. Cohen, “Absorption spectra of cations in alkali-silicate glasses of ultra-violet transmission,” Phys. Chem. Glasses4, 173–187 (1963).

1962 (2)

C. R. Bamford, “The application of the ligand field theory to coloured glasses,” Phys. Chem. Glasses3, 189–202 (1962).

C. R. Bamford, “The application of the ligand field theory to coloured glasses,” Phys. Chem. Glasses3, 189–202 (1962).

Agati, A.

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Akai, T.

T. Akai, H. Yamanaka, and H. Wakabayashi, “Preparation of copper-ruby glasses by sputtering: the effect of atmosphere on the growth of copper particles,” J. Am. Ceram. Soc.79(4), 859–864 (1996).
[CrossRef]

Alpuim, P.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Alves, E.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Amiridis, M. D.

C. M. Parler, J. A. Ritter, and M. D. Amiridis, “Infrared spectroscopic study of sol–gel derived mixed-metal oxides,” J. Non-Cryst. Solids279(2-3), 119–125 (2001).
[CrossRef]

Arbab, M.

M. Arbab and J. J. Finley, “Glass in architecture,” Int. J. Appl. Glass Sci.1(1), 118–129 (2010).
[CrossRef]

Arroyo, R.

C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
[CrossRef]

Balamurugan, B.

B. Balamurugan and B. R. Mehta, “Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation,” Thin Solid Films396(1-2), 90–96 (2001).
[CrossRef]

Bamford, C. R.

C. R. Bamford, “The application of the ligand field theory to coloured glasses,” Phys. Chem. Glasses3, 189–202 (1962).

C. R. Bamford, “The application of the ligand field theory to coloured glasses,” Phys. Chem. Glasses3, 189–202 (1962).

Banakh, G.

J. Pierson, E. Duverger, and G. Banakh, “Experimental and theoretical contributions to the determination of optical properties of synthetic paramelaconite,” J. Solid State Chem.180(3), 968–973 (2007).
[CrossRef]

Barranco, A.

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

Bloomer, I.

A. Forouhi and I. Bloomer, “Optical dispersion relations for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B34(10), 7018–7026 (1986).
[CrossRef]

Caballero, A.

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

Carvalho, P.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Chappé, J. M.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Chitra, J. S. P.

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

Chockalingam, M. J.

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

Cohen, A. J.

H. L. Smith and A. J. Cohen, “Absorption spectra of cations in alkali-silicate glasses of ultra-violet transmission,” Phys. Chem. Glasses4, 173–187 (1963).

Córdoba, C.

C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
[CrossRef]

Cunha, L.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Davazoglou, D.

G. Papadimitropoulos, N. Vourdas, V. Vamvakas, and D. Davazoglou, “Optical and structural properties of copper oxide thin films grown by oxidation of metal layers,” Thin Solid Films515(4), 2428–2432 (2006).
[CrossRef]

Di Nocera, A.

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Drobny, V. F.

V. F. Drobny and D. L. Pulfrey, “Properties of reactively-sputtered copper oxide thin films,” Thin Solid Films61(1), 89–98 (1979).
[CrossRef]

Duverger, E.

J. Pierson, E. Duverger, and G. Banakh, “Experimental and theoretical contributions to the determination of optical properties of synthetic paramelaconite,” J. Solid State Chem.180(3), 968–973 (2007).
[CrossRef]

Espinós, J. P.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

Fernandez-Navarro, J. M.

M. G. Ferreira da Silva and J. M. Fernandez-Navarro, “Colour of silicate sol-gel glasses containing CuO,” J. Non-Cryst. Solids100(1-3), 447–452 (1988).
[CrossRef]

Ferreira da Silva, M. G.

M. G. Ferreira da Silva and J. M. Fernandez-Navarro, “Colour of silicate sol-gel glasses containing CuO,” J. Non-Cryst. Solids100(1-3), 447–452 (1988).
[CrossRef]

Ferrer, F. J.

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

Fierro, J. L. G.

C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
[CrossRef]

Finley, J. J.

M. Arbab and J. J. Finley, “Glass in architecture,” Int. J. Appl. Glass Sci.1(1), 118–129 (2010).
[CrossRef]

Forouhi, A.

A. Forouhi and I. Bloomer, “Optical dispersion relations for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B34(10), 7018–7026 (1986).
[CrossRef]

García-López, F. J.

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

Girardeau, T.

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

González-Elipe, A. R.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

F. Yubero, A. Stabel, and A. R. González-Elipe, “Optical properties and electron spectroscopy characterization of AlxTiyOz thin films,” J. Vac. Sci. Technol. A16(6), 3477–3482 (1998).
[CrossRef]

Gracia, F.

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

Holgado, J. P.

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

Hosono, H.

I. Nakai, C. Numako, H. Hosono, and K. Yamasaki, “Origin of the red color of satsuma copper-ruby glass as determined by EXAFS and optical absorption spectroscopy,” J. Am. Ceram. Soc.82(3), 689–695 (1999).
[CrossRef]

Jayachandran, M.

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

Jayaraj, M. K.

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Kartouni, K.

B. Lefez, R. Souchet, K. Kartouni, and M. Lenglet, “Infrared reflection study of CuO in thin oxide films,” Thin Solid Films268(1-2), 45–48 (1995).
[CrossRef]

Lanceros-Méndez, S.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Lefez, B.

B. Lefez, R. Souchet, K. Kartouni, and M. Lenglet, “Infrared reflection study of CuO in thin oxide films,” Thin Solid Films268(1-2), 45–48 (1995).
[CrossRef]

Lenglet, M.

B. Lefez, R. Souchet, K. Kartouni, and M. Lenglet, “Infrared reflection study of CuO in thin oxide films,” Thin Solid Films268(1-2), 45–48 (1995).
[CrossRef]

Liu, F.

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

Loreti, S.

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Ma, T. C.

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

Mahalingam, T.

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

Mehta, B. R.

B. Balamurugan and B. R. Mehta, “Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation,” Thin Solid Films396(1-2), 90–96 (2001).
[CrossRef]

Mejías, J. A.

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

Morales, J.

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

Moretti, G.

G. Moretti, “Auger parameter and Wagner plot in the characterization of chemical states by X-ray photoelectron spectroscopy: a review,” J. Electron Spectrosc. Relat. Phenom.95(2-3), 95–144 (1998).
[CrossRef]

Nakai, I.

I. Nakai, C. Numako, H. Hosono, and K. Yamasaki, “Origin of the red color of satsuma copper-ruby glass as determined by EXAFS and optical absorption spectroscopy,” J. Am. Ceram. Soc.82(3), 689–695 (1999).
[CrossRef]

Numako, C.

I. Nakai, C. Numako, H. Hosono, and K. Yamasaki, “Origin of the red color of satsuma copper-ruby glass as determined by EXAFS and optical absorption spectroscopy,” J. Am. Ceram. Soc.82(3), 689–695 (1999).
[CrossRef]

Papadimitropoulos, G.

G. Papadimitropoulos, N. Vourdas, V. Vamvakas, and D. Davazoglou, “Optical and structural properties of copper oxide thin films grown by oxidation of metal layers,” Thin Solid Films515(4), 2428–2432 (2006).
[CrossRef]

Parler, C. M.

C. M. Parler, J. A. Ritter, and M. D. Amiridis, “Infrared spectroscopic study of sol–gel derived mixed-metal oxides,” J. Non-Cryst. Solids279(2-3), 119–125 (2001).
[CrossRef]

Parretta, A.

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Pierson, J.

J. Pierson, E. Duverger, and G. Banakh, “Experimental and theoretical contributions to the determination of optical properties of synthetic paramelaconite,” J. Solid State Chem.180(3), 968–973 (2007).
[CrossRef]

Pulfrey, D. L.

V. F. Drobny and D. L. Pulfrey, “Properties of reactively-sputtered copper oxide thin films,” Thin Solid Films61(1), 89–98 (1979).
[CrossRef]

Qi, X. L.

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

Quercia, L.

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Rajendran, S.

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

Rakhshani, A. E.

A. E. Rakhshani, “Measurement of dispersion in electrodeposited Cu2O,” J. Appl. Phys.62(4), 1528–1529 (1987).
[CrossRef]

Rao, G. V.

A. S. Reddy, G. V. Rao, S. Uthanna, and P. S. Reddy, “Structural and optical studies on dc reactive magnetron sputtered Cu2O films,” Mater. Lett.60(13-14), 1617–1621 (2006).
[CrossRef]

Reddy, A. S.

A. S. Reddy, G. V. Rao, S. Uthanna, and P. S. Reddy, “Structural and optical studies on dc reactive magnetron sputtered Cu2O films,” Mater. Lett.60(13-14), 1617–1621 (2006).
[CrossRef]

Reddy, P. S.

A. S. Reddy, G. V. Rao, S. Uthanna, and P. S. Reddy, “Structural and optical studies on dc reactive magnetron sputtered Cu2O films,” Mater. Lett.60(13-14), 1617–1621 (2006).
[CrossRef]

Ren, C. S.

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

Ritter, J. A.

C. M. Parler, J. A. Ritter, and M. D. Amiridis, “Infrared spectroscopic study of sol–gel derived mixed-metal oxides,” J. Non-Cryst. Solids279(2-3), 119–125 (2001).
[CrossRef]

Rousselot, C.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Scrocco, M.

M. Scrocco, “Satellite structure in the x-ray photoelectron spectra of CuO Cu2O,” Chem. Phys. Lett.63(1), 52–56 (1979).
[CrossRef]

Smith, H. L.

H. L. Smith and A. J. Cohen, “Absorption spectra of cations in alkali-silicate glasses of ultra-violet transmission,” Phys. Chem. Glasses4, 173–187 (1963).

Souchet, R.

B. Lefez, R. Souchet, K. Kartouni, and M. Lenglet, “Infrared reflection study of CuO in thin oxide films,” Thin Solid Films268(1-2), 45–48 (1995).
[CrossRef]

Stabel, A.

F. Yubero, A. Stabel, and A. R. González-Elipe, “Optical properties and electron spectroscopy characterization of AlxTiyOz thin films,” J. Vac. Sci. Technol. A16(6), 3477–3482 (1998).
[CrossRef]

Uthanna, S.

A. S. Reddy, G. V. Rao, S. Uthanna, and P. S. Reddy, “Structural and optical studies on dc reactive magnetron sputtered Cu2O films,” Mater. Lett.60(13-14), 1617–1621 (2006).
[CrossRef]

Vamvakas, V.

G. Papadimitropoulos, N. Vourdas, V. Vamvakas, and D. Davazoglou, “Optical and structural properties of copper oxide thin films grown by oxidation of metal layers,” Thin Solid Films515(4), 2428–2432 (2006).
[CrossRef]

Vaz, F.

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

Viniegra, M.

C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
[CrossRef]

Vourdas, N.

G. Papadimitropoulos, N. Vourdas, V. Vamvakas, and D. Davazoglou, “Optical and structural properties of copper oxide thin films grown by oxidation of metal layers,” Thin Solid Films515(4), 2428–2432 (2006).
[CrossRef]

Wagner, C. D.

C. D. Wagner, “Chemical shifts of Auger lines, and the Auger parameter,” Faraday Discuss. Chem. Soc.60, 291–300 (1975).
[CrossRef]

Wakabayashi, H.

T. Akai, H. Yamanaka, and H. Wakabayashi, “Preparation of copper-ruby glasses by sputtering: the effect of atmosphere on the growth of copper particles,” J. Am. Ceram. Soc.79(4), 859–864 (1996).
[CrossRef]

Wang, Y. N.

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

Yamanaka, H.

T. Akai, H. Yamanaka, and H. Wakabayashi, “Preparation of copper-ruby glasses by sputtering: the effect of atmosphere on the growth of copper particles,” J. Am. Ceram. Soc.79(4), 859–864 (1996).
[CrossRef]

Yamasaki, K.

I. Nakai, C. Numako, H. Hosono, and K. Yamasaki, “Origin of the red color of satsuma copper-ruby glass as determined by EXAFS and optical absorption spectroscopy,” J. Am. Ceram. Soc.82(3), 689–695 (1999).
[CrossRef]

Yubero, F.

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

F. Yubero, A. Stabel, and A. R. González-Elipe, “Optical properties and electron spectroscopy characterization of AlxTiyOz thin films,” J. Vac. Sci. Technol. A16(6), 3477–3482 (1998).
[CrossRef]

Chem. Phys. Lett. (1)

M. Scrocco, “Satellite structure in the x-ray photoelectron spectra of CuO Cu2O,” Chem. Phys. Lett.63(1), 52–56 (1979).
[CrossRef]

Faraday Discuss. Chem. Soc. (1)

C. D. Wagner, “Chemical shifts of Auger lines, and the Auger parameter,” Faraday Discuss. Chem. Soc.60, 291–300 (1975).
[CrossRef]

Int. J. Appl. Glass Sci. (1)

M. Arbab and J. J. Finley, “Glass in architecture,” Int. J. Appl. Glass Sci.1(1), 118–129 (2010).
[CrossRef]

J. Am. Ceram. Soc. (2)

I. Nakai, C. Numako, H. Hosono, and K. Yamasaki, “Origin of the red color of satsuma copper-ruby glass as determined by EXAFS and optical absorption spectroscopy,” J. Am. Ceram. Soc.82(3), 689–695 (1999).
[CrossRef]

T. Akai, H. Yamanaka, and H. Wakabayashi, “Preparation of copper-ruby glasses by sputtering: the effect of atmosphere on the growth of copper particles,” J. Am. Ceram. Soc.79(4), 859–864 (1996).
[CrossRef]

J. Appl. Phys. (3)

P. Carvalho, J. M. Chappé, L. Cunha, S. Lanceros-Méndez, P. Alpuim, F. Vaz, E. Alves, C. Rousselot, J. P. Espinós, and A. R. González-Elipe, “Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films,” J. Appl. Phys.103(10), 104907 (2008).
[CrossRef]

A. E. Rakhshani, “Measurement of dispersion in electrodeposited Cu2O,” J. Appl. Phys.62(4), 1528–1529 (1987).
[CrossRef]

F. J. Ferrer, F. Yubero, J. A. Mejías, F. J. García-López, and A. R. González-Elipe, “Microscopic and macroscopic dielectric description of mixed oxide thin films,” J. Appl. Phys.102(8), 084112 (2007).
[CrossRef]

J. Cryst. Growth (1)

T. Mahalingam, J. S. P. Chitra, S. Rajendran, M. Jayachandran, and M. J. Chockalingam, “Galvanostatic deposition and characterization of cuprous oxide thin films,” J. Cryst. Growth216(1-4), 304–310 (2000).
[CrossRef]

J. Electron Spectrosc. Relat. Phenom. (1)

G. Moretti, “Auger parameter and Wagner plot in the characterization of chemical states by X-ray photoelectron spectroscopy: a review,” J. Electron Spectrosc. Relat. Phenom.95(2-3), 95–144 (1998).
[CrossRef]

J. Non-Cryst. Solids (2)

C. M. Parler, J. A. Ritter, and M. D. Amiridis, “Infrared spectroscopic study of sol–gel derived mixed-metal oxides,” J. Non-Cryst. Solids279(2-3), 119–125 (2001).
[CrossRef]

M. G. Ferreira da Silva and J. M. Fernandez-Navarro, “Colour of silicate sol-gel glasses containing CuO,” J. Non-Cryst. Solids100(1-3), 447–452 (1988).
[CrossRef]

J. Phys. Chem. B (2)

J. P. Espinós, J. Morales, A. Barranco, A. Caballero, J. P. Holgado, and A. R. González-Elipe, “Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts,” J. Phys. Chem. B106(27), 6921–6929 (2002).
[CrossRef]

J. Morales, J. P. Espinós, A. Caballero, A. R. González-Elipe, and J. A. Mejías, “XPS study of interface and ligand effects in supported Cu2O and CuO nanometric particles,” J. Phys. Chem. B109(16), 7758–7765 (2005).
[CrossRef] [PubMed]

J. Solid State Chem. (2)

J. Pierson, E. Duverger, and G. Banakh, “Experimental and theoretical contributions to the determination of optical properties of synthetic paramelaconite,” J. Solid State Chem.180(3), 968–973 (2007).
[CrossRef]

C. Córdoba, R. Arroyo, J. L. G. Fierro, and M. Viniegra, “Study of xerogel–glass transition of CuO/SiO2,” J. Solid State Chem.123(1), 93–99 (1996).
[CrossRef]

J. Vac. Sci. Technol. A (1)

F. Yubero, A. Stabel, and A. R. González-Elipe, “Optical properties and electron spectroscopy characterization of AlxTiyOz thin films,” J. Vac. Sci. Technol. A16(6), 3477–3482 (1998).
[CrossRef]

Mater. Lett. (1)

A. S. Reddy, G. V. Rao, S. Uthanna, and P. S. Reddy, “Structural and optical studies on dc reactive magnetron sputtered Cu2O films,” Mater. Lett.60(13-14), 1617–1621 (2006).
[CrossRef]

Phys. Chem. Glasses (3)

H. L. Smith and A. J. Cohen, “Absorption spectra of cations in alkali-silicate glasses of ultra-violet transmission,” Phys. Chem. Glasses4, 173–187 (1963).

C. R. Bamford, “The application of the ligand field theory to coloured glasses,” Phys. Chem. Glasses3, 189–202 (1962).

C. R. Bamford, “The application of the ligand field theory to coloured glasses,” Phys. Chem. Glasses3, 189–202 (1962).

Phys. Rev. B (1)

A. Forouhi and I. Bloomer, “Optical dispersion relations for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B34(10), 7018–7026 (1986).
[CrossRef]

Phys. Status Solidi A (1)

A. Parretta, M. K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati, “Electrical and optical properties of copper oxide films prepared by reactive RF magnetron sputtering,” Phys. Status Solidi A155(2), 399–404 (1996).
[CrossRef]

Thin Solid Films (5)

F. Gracia, F. Yubero, J. P. Holgado, J. P. Espinós, A. R. González-Elipe, and T. Girardeau, “SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition,” Thin Solid Films500(1-2), 19–26 (2006).
[CrossRef]

G. Papadimitropoulos, N. Vourdas, V. Vamvakas, and D. Davazoglou, “Optical and structural properties of copper oxide thin films grown by oxidation of metal layers,” Thin Solid Films515(4), 2428–2432 (2006).
[CrossRef]

B. Lefez, R. Souchet, K. Kartouni, and M. Lenglet, “Infrared reflection study of CuO in thin oxide films,” Thin Solid Films268(1-2), 45–48 (1995).
[CrossRef]

V. F. Drobny and D. L. Pulfrey, “Properties of reactively-sputtered copper oxide thin films,” Thin Solid Films61(1), 89–98 (1979).
[CrossRef]

B. Balamurugan and B. R. Mehta, “Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation,” Thin Solid Films396(1-2), 90–96 (2001).
[CrossRef]

Vacuum (1)

F. Liu, C. S. Ren, Y. N. Wang, X. L. Qi, and T. C. Ma, “The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system,” Vacuum81(3), 221–225 (2006).
[CrossRef]

Other (3)

R. Fernandez-Serrano, A. Vilajoana-Mas, J.C. Dürsteler-López, J. Gil-Rostra, F. Yubero-Valencia, A.R. González-Elipe, “Polymer lens comprising a hardening layer, and absorbent layer, and a interferential multilayer and corresponding method,” PCT/ES2010/000100.

J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, 1985), Vol. I.

J. Schanda, Colorimetry: Understanding of the CIE System (John Wiley and Sons, 2007).

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Figures (11)

Fig. 1
Fig. 1

OES spectra corresponding to several ΦO2Ar ratios of the process plasma discharge, as indicated. Bands are assigned to different species according to [15]. Inset: Intensity ratios of the strongest Cu (I324 + I327) and Ar (I416 + I420) emission lines in the plasma discharge as a function of the gas flow ratio ΦO2Ar corresponding to a Si target with 3 Cu strips, 100 W applied power and 5x10−3 mbar total pressure in the reaction chamber.

Fig. 2
Fig. 2

Experimental and fitted RBS spectra of two selected mixed Cu-Si oxide thin films. The spectra demonstrate a homogenous in-depth distribution of Cu and Si atoms.

Fig. 3
Fig. 3

SEM cross section micrograph of a typical Cu-Si oxide thin film.

Fig. 4
Fig. 4

FT-IR spectra of a series of Cu-Si oxide thin films with increasing number of Cu strips in the Si cathode and prepared with 3 strips and increasing values of ΦO2Ar for the process gas.

Fig. 5
Fig. 5

Cu 2p photoemission spectra of Cu-Si oxide thin films prepared with different experimental process parameters.

Fig. 6
Fig. 6

Silicon Auger parameter αSi (left) and Cu Auger parameters αCu (right) as a function of the composition of the Cu-Si oxide thin films.

Fig. 7
Fig. 7

UV-Vis transmission spectra of a series of Cu-Si oxide thin films prepared under several preparation conditions (see legend).

Fig. 8
Fig. 8

Refractive index (left) and extinction coefficient (right) of a series of Cu-Si oxide thin films for a ΦO2Ar ratio of 1.0 and different number of strips in the cathode and for 3 stripes and different values of the ΦO2Ar ratio.

Fig. 9
Fig. 9

Absorption coefficient of a series of Cu-Si oxide thin films for an ΦO2Ar ratio of 1.0 and different number of stripes in the cathode and for 3 strips and different values of the ΦO2Ar ratio.

Fig. 10
Fig. 10

Left: (x,y) chromaticity coordinates (evaluated in transmission) of the Cu-Si oxide thin films studied in this work represented in the CIE 1931 chromaticity diagram. Right: Example of the deposition of Si-Cu mixed oxides with 1, 2 or 3 Cu strips wrapped to a Si target and ΦO2Ar = 0.1.

Fig. 11
Fig. 11

L*, a*, and b* color coordinates in the CIELAB color space of the Cu-Si oxide thin films studied in this work.

Tables (1)

Tables Icon

Table 1 Survey of Experimental Conditions and Properties Obtained for Mixed Si-Cu Oxides Prepared by Reactive Magnetron Sputtering

Metrics