Abstract
We report on the fabrication of a ${160} \times {120}$ visible (Vis)-extended InGaAs/InP focal plane array (FPA) by means of the inductively coupled plasma etching. Compared to the conventional Vis-InGaAs FPAs, higher quantum efficiency in the Vis spectrum has been achieved. High precision thinning of the $n$-type InP contact layer down to 10 nm has led to quantum efficiencies higher than 60% over a broad wavelength range of 500–1700 nm. Benefiting from the textured surface after plasma etching, 17% lower reflectance over the entire response range was also found. Enhanced Vis/near-infrared (NIR) laboratory imaging capability has also been demonstrated, which has proved the feasibility of such processes for fabrication of future higher definition Vis/NIR InGaAs imagers.
© 2019 Optical Society of America
Full Article | PDF ArticleMore Like This
Yu Han, Wai Kit Ng, Ying Xue, Qiang Li, Kam Sing Wong, and Kei May Lau
Opt. Lett. 44(4) 767-770 (2019)
Duo Sun, Bo Feng, Bo Yang, Tao Li, Xiumei Shao, Xue Li, and Yifang Chen
Opt. Lett. 45(6) 1559-1562 (2020)
Yuan Yuan, Daehwan Jung, Keye Sun, Jiyuan Zheng, Andrew H. Jones, John E. Bowers, and Joe C. Campbell
Opt. Lett. 44(14) 3538-3541 (2019)