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Deep-ultraviolet spatial-period division using an excimer laser

A. M. Hawryluk, Henry I. Smith, R. M. Osgood, and D. J. Ehrlich

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Abstract

We have used the deep-UV output from an ArF laser and a grating mask with 199-nm spatial period to fabricate a 99.5-nm-period grating pattern in polymethyl methacrylate resist by spatial-period division. For sub 100 nm, lithography of periodic and quasi-periodic patterns (including Fresnel zone plates) by spatial-period division, deep-UV radiation offers a number of advantages over soft x rays.

© 1982 Optical Society of America

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