Abstract

We report nano-needle structured conductive SnOx (x1) as a self-assembled electrode for high-efficiency light trapping in thin-film infrared (IR) photonic devices, benefiting from the high scattering efficiency, high density, and low IR loss of the nano-needles. We demonstrate a 2.2× responsivity enhancement for a 1.5-μm-thick Ge absorber in a nano-needled p+SnOx/n-Ge photodiode on Si at λ=1580nm, in good agreement with theoretical calculation of 2.3× enhancement assuming no IR loss in the nano-needles. Such low-loss light trapping can potentially enable 1530× absorption enhancement at λ=16001650nm in the Ge layer when integrated with a perfect rear reflector.

© 2015 Optical Society of America

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