In this work, we present a simple fabrication process enabling the integration of a subwavelength amorphous silicon layer inside optical fibers by means of the arc discharge technique. To assess our method, we have fabricated a compact in-line Fabry–Perot interferometer consisting of a thin () a-Si:H layer completely embedded within a standard single-mode optical fiber. The device exhibits low loss (1.3 dB) and high interference fringe visibility () both in reflection and transmission, due to the high refractive index contrast between silica and a-Si:H. A high linear temperature sensitivity up to is demonstrated in the range 120°C–400°C. The proposed interferometer is attractive for point monitoring applications as well as for ultrahigh-temperature sensing in harsh environments.
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