We report about a newly devised throughput-scalable fabrication method for high-quality periodic submicron structures. The process is demonstrated for optical transmission gratings in fused silica with a period of 800 nm () to be used in laser pulse compression. The technology is based on an innovative advancement of i-line proximity photolithography performed in a mask aligner. The aerial image is encoded in a rigorously optimized electron-beam-written three-level phase mask which is illuminated by an adapted multipole configuration of incidence angles. In comparison to conventional proximity lithography, the process enables a significantly higher resolution while maintaining a good depth of focus—in contrast to lithography based on direct Talbot-imaging. Details about the grating fabrication process and characterization of fabricated pulse compression grating wafers are presented. The gratings show a diffraction efficiency of 97% at a wavelength of 1030 nm and a wavefront error comparable to gratings fabricated by electron-beam lithography.
© 2014 Optical Society of AmericaFull Article | PDF Article
Wanji Yu, Koji Takahara, Tsuyoshi Konishi, Tsutom Yotsuya, and Yoshiki Ichioka
Appl. Opt. 39(20) 3531-3536 (2000)
Giuseppe A. Cirino, Ronaldo D. Mansano, Patrick Verdonck, Lucila Cescato, and Luiz G. Neto
Opt. Express 18(16) 16387-16405 (2010)
Maria Oliva, Dirk Michaelis, Tino Benkenstein, Jens Dunkel, Torsten Harzendorf, Andre Matthes, and Uwe D. Zeitner
Opt. Lett. 35(16) 2774-2776 (2010)