Abstract

In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples.

© 2014 Optical Society of America

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    [CrossRef]
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    [CrossRef]
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2013

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

2012

W. Yuan, A. Stefani, and O. Bang, IEEE Photon. Technol. Lett. 24, 401 (2012).
[CrossRef]

2010

2005

2004

D. R. Tyler, Polym. Rev. 44, 351 (2004).

1993

T. Mitsuoka, A. Torikai, and K. Fueki, J. Appl. Polym. Sci. 47, 1027 (1993).
[CrossRef]

1990

A. Torikai, M. Ohno, and K. Fueki, J. Appl. Polym. Sci. 41, 1023 (1990).
[CrossRef]

1984

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

1974

1973

1971

I. P. Kaminow, H. P. Weber, and E. A. Chandross, Appl. Phys. Lett. 18, 497 (1971).
[CrossRef]

1970

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

Abang, A.

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

Argyros, A.

Bang, O.

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

W. Yuan, A. Stefani, and O. Bang, IEEE Photon. Technol. Lett. 24, 401 (2012).
[CrossRef]

Baum, A.

Bowden, M. J.

Chandross, E. A.

M. J. Bowden, E. A. Chandross, and I. P. Kaminow, Appl. Opt. 13, 112 (1974).
[CrossRef]

I. P. Kaminow, H. P. Weber, and E. A. Chandross, Appl. Phys. Lett. 18, 497 (1971).
[CrossRef]

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

Dobb, H.

Eijkelenborg, M. A. V.

Fork, R. L.

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

Franke, H.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Fueki, K.

T. Mitsuoka, A. Torikai, and K. Fueki, J. Appl. Polym. Sci. 47, 1027 (1993).
[CrossRef]

A. Torikai, M. Ohno, and K. Fueki, J. Appl. Polym. Sci. 41, 1023 (1990).
[CrossRef]

Kalli, K.

H. Dobb, D. J. Webb, K. Kalli, A. Argyros, M. C. J. Large, and M. A. V. Eijkelenborg, Opt. Lett. 30, 3296 (2005).
[CrossRef]

A. Othonos and K. Kalli, Fiber Bragg Grating: Fundamentals and Applications in Telecommunications and Sensing (Artech House, 1999).

Kaminow, I. P.

M. J. Bowden, E. A. Chandross, and I. P. Kaminow, Appl. Opt. 13, 112 (1974).
[CrossRef]

J. M. Moran and I. P. Kaminow, Appl. Opt. 12, 1964 (1973).
[CrossRef]

I. P. Kaminow, H. P. Weber, and E. A. Chandross, Appl. Phys. Lett. 18, 497 (1971).
[CrossRef]

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

Kausch, H. H.

H. H. Kausch, Polymer Fracture (Springer-Verlag, 1978).

Kopietz, M.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Krätzig, E.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Large, M. C. J.

Lechner, M. D.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Liu, D.

Lucarini, V.

Marotz, J.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Mitsuoka, T.

T. Mitsuoka, A. Torikai, and K. Fueki, J. Appl. Polym. Sci. 47, 1027 (1993).
[CrossRef]

Moran, J. M.

Nielsen, K.

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

Ohno, M.

A. Torikai, M. Ohno, and K. Fueki, J. Appl. Polym. Sci. 41, 1023 (1990).
[CrossRef]

Othonos, A.

A. Othonos and K. Kalli, Fiber Bragg Grating: Fundamentals and Applications in Telecommunications and Sensing (Artech House, 1999).

Perrie, W.

Saez-Rodriguez, D.

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

Scully, P.

Silfvast, W. T.

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

Stefani, A.

W. Yuan, A. Stefani, and O. Bang, IEEE Photon. Technol. Lett. 24, 401 (2012).
[CrossRef]

Steinmeier, D. G.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Tomlinson, W. J.

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

Torikai, A.

T. Mitsuoka, A. Torikai, and K. Fueki, J. Appl. Polym. Sci. 47, 1027 (1993).
[CrossRef]

A. Torikai, M. Ohno, and K. Fueki, J. Appl. Polym. Sci. 41, 1023 (1990).
[CrossRef]

Tyler, D. R.

D. R. Tyler, Polym. Rev. 44, 351 (2004).

Webb, D. J.

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

H. Dobb, D. J. Webb, K. Kalli, A. Argyros, M. C. J. Large, and M. A. V. Eijkelenborg, Opt. Lett. 30, 3296 (2005).
[CrossRef]

Weber, H. P.

I. P. Kaminow, H. P. Weber, and E. A. Chandross, Appl. Phys. Lett. 18, 497 (1971).
[CrossRef]

Yuan, W.

W. Yuan, A. Stefani, and O. Bang, IEEE Photon. Technol. Lett. 24, 401 (2012).
[CrossRef]

Appl. Opt.

Appl. Phys. Lett.

W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, and W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
[CrossRef]

I. P. Kaminow, H. P. Weber, and E. A. Chandross, Appl. Phys. Lett. 18, 497 (1971).
[CrossRef]

IEEE Photon. Technol. Lett.

W. Yuan, A. Stefani, and O. Bang, IEEE Photon. Technol. Lett. 24, 401 (2012).
[CrossRef]

J. Appl. Polym. Sci.

A. Torikai, M. Ohno, and K. Fueki, J. Appl. Polym. Sci. 41, 1023 (1990).
[CrossRef]

T. Mitsuoka, A. Torikai, and K. Fueki, J. Appl. Polym. Sci. 47, 1027 (1993).
[CrossRef]

J. Opt. Soc. Am. B

Opt. Lett.

Polym. Photochem.

M. Kopietz, M. D. Lechner, D. G. Steinmeier, J. Marotz, H. Franke, and E. Krätzig, Polym. Photochem. 5, 109 (1984).
[CrossRef]

Polym. Rev.

D. R. Tyler, Polym. Rev. 44, 351 (2004).

Proc. SPIE

A. Abang, D. Saez-Rodriguez, K. Nielsen, O. Bang, and D. J. Webb, Proc. SPIE 8794, 87943Q (2013), doi: 10.1117/12.2026796.
[CrossRef]

Other

H. H. Kausch, Polymer Fracture (Springer-Verlag, 1978).

A. Othonos and K. Kalli, Fiber Bragg Grating: Fundamentals and Applications in Telecommunications and Sensing (Artech House, 1999).

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Figures (5)

Fig. 1.
Fig. 1.

mPOF cross section.

Fig. 2.
Fig. 2.

Bragg reflection against inscription strain: (a) grating pitch of 278.75 nm and (b) grating pitch of 530.59 nm.

Fig. 3.
Fig. 3.

Photodegradation process of undoped PMMA under UV radiation at 325 nm.

Fig. 4.
Fig. 4.

(a) Index change of an 827 nm grating. (b) Index change of a 1562 nm grating.

Fig. 5.
Fig. 5.

RIM against inscription strain (a) grating pitch of 278.75 nm and (b) grating pitch of 530.59 nm.

Tables (1)

Tables Icon

Table 1. Reflectivity versus Inscription Strain for Grating Pitches of 530.59 and 278.75 nm

Equations (2)

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λ = 2 · Λ · n 1 ,
R = tanh 2 ( K · L ) K = π · Δ n · η λ ,

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