Damage threshold influenced by the high absorption defect at the film–substrate interface under ultraviolet laser irradiation

Abstract

The laser-induced damage threshold (LIDT) of a single-layer coating at the nanosecond (ns) regime is obviously lower than an uncoated substrate or a high reflectivity coating coated by the same material. To elucidate this phenomenon, we demonstrate the LIDT of three types of samples at 355 nm with 8 ns. High absorption defects are found at the film–substrate interface by comparing their LIDTs and damage morphologies. These defects originate from the substrate and appear during the coating process. Simulation results show that these defects, coupled to the coating, are mainly responsible for decreasing the damage threshold.

© 2013 Optical Society of America

Improving laser damage resistance of 355  nm high-reflective coatings by co-evaporated interfaces

Huanbin Xing, Meiping Zhu, Yingjie Chai, Kui Yi, Jian Sun, Yun Cui, and Jianda Shao
Opt. Lett. 41(6) 1253-1256 (2016)

Experimental demonstration of laser damage caused by interface coupling effects of substrate surface and coating layers

Yingjie Chai, Meiping Zhu, Kui Yi, Weili Zhang, Hu Wang, Zhou Fang, Zhengyuan Bai, Yun Cui, and Jianda Shao
Opt. Lett. 40(16) 3731-3734 (2015)

Effect of etching morphology of artificial defect on laser-induced damage properties under 355  nm laser irradiation

Bin Ma, Menglei Lu, Guangda Zhan, Ke Wang, Xinbin Cheng, and Zhanshan Wang
Appl. Opt. 54(11) 3365-3371 (2015)

Annealing effects on microstructure and laser-induced damage threshold of HfO₂/SiO₂ multilayer mirrors

Shuvendu Jena, Raj Bahadur Tokas, K. Divakar Rao, Sudhakar Thakur, and Naba Kishore Sahoo
Appl. Opt. 55(22) 6108-6114 (2016)

Investigations on single and multiple pulse laser-induced damages in HfO₂/SiO₂ multilayer dielectric films at 1064 nm

Wenwen Liu, Chaoyang Wei, Jianbo Wu, Zhenkun Yu, Hui Cui, Kui Yi, and Jianda Shao
Opt. Express 21(19) 22476-22487 (2013)