Abstract

A two-dimensional TiO2 photonic crystal layer is fabricated on Y3Al5O12:Ce3+(YAG:Ce) yellow ceramic plate phosphor (CPP) to enhance its forward emission. A triangle lattice pattern is defined by molecular transfer lithography with polyvinyl alcohol nanostructured templates. A 4.5 improvement in yellow emission is achieved from photonic-crystal-structure (PhC) patterned YAG:Ce CPP compared to a nonpatterned one. The PhC-patterned YAG:Ce CPP shows a collimated far-field intensity emission pattern compared to the random-patterned and nonpatterned one.

© 2013 Optical Society of America

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  1. H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
  8. J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
    [CrossRef]
  9. P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
    [CrossRef]
  10. X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
  15. W. Hou, “Contact formation and pattering approaches for group III nitride light emitters,” Ph.D. dissertation (Rensselaer Polytechnic Institute, 2013).

2013

P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
[CrossRef]

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

A. Mao, C. D. Schaper, and R. F. Karlicek, Nanotechnology 24, 085302 (2013).
[CrossRef]

2012

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

2011

H. K. Park, J. R. Oh, and Y. R. Do, Opt. Express 19, 25593 (2011).
[CrossRef]

Y. Shuai, N. T. Tran, and F. G. Shi, IEEE Photon. Technol. Lett. 23, 552 (2011).
[CrossRef]

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

2005

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

N. Narendran, Y. Gu, J. P. Freyssinier-Nova, and Y. Zhu, Phys. Status Solidi A 202, R60 (2005).
[CrossRef]

2004

T. N. Oder, K. H. Kim, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 466 (2004).
[CrossRef]

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

2003

J. D. Carey, L. L. Ong, and S. R. P. Silva, Nanotechnology 14, 1223 (2003).
[CrossRef]

Benicewicz, B. C.

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

Carey, J. D.

J. D. Carey, L. L. Ong, and S. R. P. Silva, Nanotechnology 14, 1223 (2003).
[CrossRef]

Cho, J.

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

Craford, M. G.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Detchprohm, T.

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

Do, Y. R.

Ee, Y. K.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Epler, J. E.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Freyssinier-Nova, J. P.

N. Narendran, Y. Gu, J. P. Freyssinier-Nova, and Y. Zhu, Phys. Status Solidi A 202, R60 (2005).
[CrossRef]

Gardner, N. F.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Gilchrist, J. F.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Gu, Y.

N. Narendran, Y. Gu, J. P. Freyssinier-Nova, and Y. Zhu, Phys. Status Solidi A 202, R60 (2005).
[CrossRef]

Hou, W.

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

W. Hou, “Contact formation and pattering approaches for group III nitride light emitters,” Ph.D. dissertation (Rensselaer Polytechnic Institute, 2013).

Jiang, H. X.

T. N. Oder, K. H. Kim, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 466 (2004).
[CrossRef]

Jose, M. T.

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

Karlicek, R. F.

A. Mao, C. D. Schaper, and R. F. Karlicek, Nanotechnology 24, 085302 (2013).
[CrossRef]

Kim, J. K.

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

Kim, K. H.

T. N. Oder, K. H. Kim, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 466 (2004).
[CrossRef]

Krames, M. R.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Kumar, R. S.

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

Kumnorkaew, P.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Lakshmanan, A.

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

Li, F.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Li, X. H.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Li, Y.

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

Lin, J. Y.

T. N. Oder, K. H. Kim, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 466 (2004).
[CrossRef]

Liu, G. Y.

P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
[CrossRef]

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Lu, T.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Lu, Z.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Luo, H.

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

Ma, B.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Mao, A.

A. Mao, C. D. Schaper, and R. F. Karlicek, Nanotechnology 24, 085302 (2013).
[CrossRef]

Narendran, N.

N. Narendran, Y. Gu, J. P. Freyssinier-Nova, and Y. Zhu, Phys. Status Solidi A 202, R60 (2005).
[CrossRef]

Oder, T. N.

T. N. Oder, K. H. Kim, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 466 (2004).
[CrossRef]

Oh, J. R.

Ong, L. L.

J. D. Carey, L. L. Ong, and S. R. P. Silva, Nanotechnology 14, 1223 (2003).
[CrossRef]

Park, H. K.

Park, Y.

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

Qi, J.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Schadler, L. S.

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

Schaper, C. D.

A. Mao, C. D. Schaper, and R. F. Karlicek, Nanotechnology 24, 085302 (2013).
[CrossRef]

Schubert, E. F.

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

Shi, F. G.

Y. Shuai, N. T. Tran, and F. G. Shi, IEEE Photon. Technol. Lett. 23, 552 (2011).
[CrossRef]

Shuai, Y.

Y. Shuai, N. T. Tran, and F. G. Shi, IEEE Photon. Technol. Lett. 23, 552 (2011).
[CrossRef]

Sigalas, M. M.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Silva, S. R. P.

J. D. Carey, L. L. Ong, and S. R. P. Silva, Nanotechnology 14, 1223 (2003).
[CrossRef]

Simmons, J. A.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Sivakumar, V.

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

Sone, C.

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

Song, R. B.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Tansu, N.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
[CrossRef]

Tao, P.

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

Thomas, P. C.

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

Tran, N. T.

Y. Shuai, N. T. Tran, and F. G. Shi, IEEE Photon. Technol. Lett. 23, 552 (2011).
[CrossRef]

Viswanath, A.

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

Wang, X.

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

Wei, N.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Wendt, J. R.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

Wetzel, C.

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

Wierer, J. J.

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

You, S.

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

Zhang, J.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
[CrossRef]

Zhang, W.

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

Zhao, L.

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

Zhu, P. F.

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
[CrossRef]

Zhu, Y.

N. Narendran, Y. Gu, J. P. Freyssinier-Nova, and Y. Zhu, Phys. Status Solidi A 202, R60 (2005).
[CrossRef]

Appl. Phys. Lett.

T. N. Oder, K. H. Kim, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 466 (2004).
[CrossRef]

J. J. Wierer, M. R. Krames, J. E. Epler, N. F. Gardner, M. G. Craford, J. R. Wendt, J. A. Simmons, and M. M. Sigalas, Appl. Phys. Lett. 84, 3885 (2004).
[CrossRef]

H. Luo, J. K. Kim, E. F. Schubert, J. Cho, C. Sone, and Y. Park, Appl. Phys. Lett. 86, 243505 (2005).
[CrossRef]

N. Wei, T. Lu, F. Li, W. Zhang, B. Ma, Z. Lu, and J. Qi, Appl. Phys. Lett. 101, 061902 (2012).
[CrossRef]

IEEE Photon. Technol. Lett.

Y. Shuai, N. T. Tran, and F. G. Shi, IEEE Photon. Technol. Lett. 23, 552 (2011).
[CrossRef]

Indian J. Pure Appl. Phys.

A. Lakshmanan, R. S. Kumar, V. Sivakumar, P. C. Thomas, and M. T. Jose, Indian J. Pure Appl. Phys. 49, 303 (2011).

J. Disp. Technol.

P. F. Zhu, G. Y. Liu, J. Zhang, and N. Tansu, J. Disp. Technol. 9, 317 (2013).
[CrossRef]

X. H. Li, P. F. Zhu, G. Y. Liu, J. Zhang, R. B. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, J. Disp. Technol. 9, 324 (2013).
[CrossRef]

Langmuir

Y. Li, P. Tao, A. Viswanath, B. C. Benicewicz, and L. S. Schadler, Langmuir 29, 1211 (2013).
[CrossRef]

Nanotechnology

A. Mao, C. D. Schaper, and R. F. Karlicek, Nanotechnology 24, 085302 (2013).
[CrossRef]

J. D. Carey, L. L. Ong, and S. R. P. Silva, Nanotechnology 14, 1223 (2003).
[CrossRef]

Opt. Express

Phys. Status Solidi A

N. Narendran, Y. Gu, J. P. Freyssinier-Nova, and Y. Zhu, Phys. Status Solidi A 202, R60 (2005).
[CrossRef]

Other

W. Hou, “Contact formation and pattering approaches for group III nitride light emitters,” Ph.D. dissertation (Rensselaer Polytechnic Institute, 2013).

W. Hou, L. Zhao, X. Wang, S. You, T. Detchprohm, and C. Wetzel, Lester Eastman Conference on High Performance Devices (IEEE, 2012).

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Figures (7)

Fig. 1.
Fig. 1.

Measured transmittance of YAG:Ce CPP for visible light.

Fig. 2.
Fig. 2.

TiO2-based photonic crystal structure on YAG:Ce CPP after ICP-RIE. The thickness of TiO2 is 300 nm.

Fig. 3.
Fig. 3.

Measured integrated light emission for PhC-patterned and nonpatterned YAG:Ce CPP from the top surface by integrating sphere.

Fig. 4.
Fig. 4.

Measured power distribution of nonpatterned YAG:Ce CPP and PhC-patterned TiO2-YAG:Ce CPP from the top surface by integrating sphere.

Fig. 5.
Fig. 5.

(a) Ni islands formed on TiO2 after RTA, used as the hard mask for random pattern; (b) measured light emission for PhC-patterned and random-patterned YAG:Ce CPP.

Fig. 6.
Fig. 6.

Measured normalized far-field intensity emission for nonpatterned, PhC-patterned, and random-patterned YAG:Ce CPP.

Fig. 7.
Fig. 7.

YBR as a function of the viewing angle for nonpatterned, PhC-patterned, and random-patterned YAG:Ce CPP.

Tables (1)

Tables Icon

Table 1. Calculated Parameters for PhC-Patterned TiO2-YAG:Ce CPP

Equations (2)

Equations on this page are rendered with MathJax. Learn more.

PY-Forward=ηextr·η·PB-absorbed,
Λ=PY-Forward-PhCPY-Forward-non=ηextr-PhCηextr-non·PB-absorbed-PhCPB-absorbed-non,

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