Abstract

An improved type of Dammann grating (DG) that could generate an equal-intensity spot array which has only three phases is proposed. Numerical solutions of 1×4 and 1×5 such DGs are given. A 4×4 two-phase DG manufactured by very-large-scale integration (VLSI) techniques is presented. A phase-shift-interferometry-based technique that measures the intensity and sub-beam phases of beam splitting gratings is proposed. The performance measurements of the manufactured 4×4 two-phase DG using the proposed technique is carried out.

© 2013 Optical Society of America

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