Abstract

The effective parallel and perpendicular dielectric constants for a multilayer metal–insulator stack are obtained from numerical simulations and compared with analytical homogenization results as a function of wavelength and number of periods. The influence of inevitable film surface roughness on the homogenized dielectric constants, determined from numerical scattered field calculations, is evaluated as a function of roughness. The impact of this roughness on resolution in a subwavelength imaging application gives smoothness guidelines for material deposition.

© 2012 Optical Society of America

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2011 (3)

T. Stefaniuk, G. Nowak, and R. Kotynski, Proc. SPIE 8070, 807010 (2011).
[CrossRef]

Z. H. Jiang, J. A. Bossard, X. Wang, and D. H. Werner, J. Appl. Phys. 109, 013515 (2011).
[CrossRef]

A. Ludwig and K. J. Webb, Opt. Lett. 36, 106 (2011).
[CrossRef]

2009 (3)

H. Liu, Shivanand, and K. J. Webb, Opt. Lett. 34, 2243 (2009).

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

M. Scholer and R. J. Blaikie, J. Opt. A 11, 105503 (2009).
[CrossRef]

2008 (2)

K. J. Webb and J. Li, Phys. Rev. A 78, 015803 (2008).
[CrossRef]

H. Liu, Shivanand, and K. J. Webb, Opt. Lett. 33, 2568 (2008).

2006 (1)

2005 (1)

N. Fang, H. Lee, C. Sun, and X. Zhang, Science 308, 534 (2005).
[CrossRef]

2003 (1)

S. A. Ramakrishna, J. B. Pendry, M. C. K. Wiltshire, and W. J. Stewart, J. Mod. Opt. 50, 1419 (2003).
[CrossRef]

2001 (1)

E. Shamonina, V. Kalinin, K. Ringhofer, and L. Solymar, Electron. Lett. 37, 1243 (2001).
[CrossRef]

1997 (1)

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

1965 (1)

W. L. Bond, J. Appl. Phys. 36, 1674 (1965).
[CrossRef]

Bagnall, D.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Blaikie, R. J.

M. Scholer and R. J. Blaikie, J. Opt. A 11, 105503 (2009).
[CrossRef]

Bond, W. L.

W. L. Bond, J. Appl. Phys. 36, 1674 (1965).
[CrossRef]

Bossard, J. A.

Z. H. Jiang, J. A. Bossard, X. Wang, and D. H. Werner, J. Appl. Phys. 109, 013515 (2011).
[CrossRef]

Chaturvedi, P.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Chen, Y.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Durbin, S. M.

S. M. Durbin, University of Purdue, West Lafayette, Indiana, “AFM roughness data for Ag and ZnO films” (personal communication, 2008).

Fang, N.

N. Fang, H. Lee, C. Sun, and X. Zhang, Science 308, 534 (2005).
[CrossRef]

Fang, N. X.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Goto, T.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Hiraga, K.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Islam, M. S.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Jiang, Z. H.

Z. H. Jiang, J. A. Bossard, X. Wang, and D. H. Werner, J. Appl. Phys. 109, 013515 (2011).
[CrossRef]

Kalinin, V.

E. Shamonina, V. Kalinin, K. Ringhofer, and L. Solymar, Electron. Lett. 37, 1243 (2001).
[CrossRef]

Kobayashi, N. P.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Kotynski, R.

T. Stefaniuk, G. Nowak, and R. Kotynski, Proc. SPIE 8070, 807010 (2011).
[CrossRef]

Koyama, S.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Lee, H.

N. Fang, H. Lee, C. Sun, and X. Zhang, Science 308, 534 (2005).
[CrossRef]

Li, J.

K. J. Webb and J. Li, Phys. Rev. A 78, 015803 (2008).
[CrossRef]

Liu, H.

Logeeswaran, V. J.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Ludwig, A.

Nowak, G.

T. Stefaniuk, G. Nowak, and R. Kotynski, Proc. SPIE 8070, 807010 (2011).
[CrossRef]

Palik, E. D.

E. D. Palik, Handbook of Optical Constants of Solids(Academic, 1998).

Park, K.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Pendry, J. B.

S. A. Ramakrishna, J. B. Pendry, M. C. K. Wiltshire, and W. J. Stewart, J. Mod. Opt. 50, 1419 (2003).
[CrossRef]

Ramakrishna, S. A.

S. A. Ramakrishna, J. B. Pendry, M. C. K. Wiltshire, and W. J. Stewart, J. Mod. Opt. 50, 1419 (2003).
[CrossRef]

Ringhofer, K.

E. Shamonina, V. Kalinin, K. Ringhofer, and L. Solymar, Electron. Lett. 37, 1243 (2001).
[CrossRef]

Scholer, M.

M. Scholer and R. J. Blaikie, J. Opt. A 11, 105503 (2009).
[CrossRef]

Sekiuchi, T.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Shamonina, E.

E. Shamonina, V. Kalinin, K. Ringhofer, and L. Solymar, Electron. Lett. 37, 1243 (2001).
[CrossRef]

Shen, M.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Shivanand,

Solymar, L.

E. Shamonina, V. Kalinin, K. Ringhofer, and L. Solymar, Electron. Lett. 37, 1243 (2001).
[CrossRef]

Stefaniuk, T.

T. Stefaniuk, G. Nowak, and R. Kotynski, Proc. SPIE 8070, 807010 (2011).
[CrossRef]

Stewart, W. J.

S. A. Ramakrishna, J. B. Pendry, M. C. K. Wiltshire, and W. J. Stewart, J. Mod. Opt. 50, 1419 (2003).
[CrossRef]

Sun, C.

N. Fang, H. Lee, C. Sun, and X. Zhang, Science 308, 534 (2005).
[CrossRef]

Wang, S. Y.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Wang, X.

Z. H. Jiang, J. A. Bossard, X. Wang, and D. H. Werner, J. Appl. Phys. 109, 013515 (2011).
[CrossRef]

Webb, K. J.

Werner, D. H.

Z. H. Jiang, J. A. Bossard, X. Wang, and D. H. Werner, J. Appl. Phys. 109, 013515 (2011).
[CrossRef]

Williams, R. S.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Wiltshire, M. C. K.

S. A. Ramakrishna, J. B. Pendry, M. C. K. Wiltshire, and W. J. Stewart, J. Mod. Opt. 50, 1419 (2003).
[CrossRef]

Wu, W.

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Yang, M.

Yao, T.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Zhang, X.

N. Fang, H. Lee, C. Sun, and X. Zhang, Science 308, 534 (2005).
[CrossRef]

Zhu, Z.

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

Electron. Lett. (1)

E. Shamonina, V. Kalinin, K. Ringhofer, and L. Solymar, Electron. Lett. 37, 1243 (2001).
[CrossRef]

J. Appl. Phys. (2)

W. L. Bond, J. Appl. Phys. 36, 1674 (1965).
[CrossRef]

Z. H. Jiang, J. A. Bossard, X. Wang, and D. H. Werner, J. Appl. Phys. 109, 013515 (2011).
[CrossRef]

J. Cryst. Growth (1)

Y. Chen, D. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Shen, and T. Goto, J. Cryst. Growth 181, 165 (1997).
[CrossRef]

J. Mod. Opt. (1)

S. A. Ramakrishna, J. B. Pendry, M. C. K. Wiltshire, and W. J. Stewart, J. Mod. Opt. 50, 1419 (2003).
[CrossRef]

J. Opt. A (1)

M. Scholer and R. J. Blaikie, J. Opt. A 11, 105503 (2009).
[CrossRef]

Nano Lett. (1)

V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, Nano Lett. 9, 178 (2009).
[CrossRef]

Opt. Lett. (4)

Phys. Rev. A (1)

K. J. Webb and J. Li, Phys. Rev. A 78, 015803 (2008).
[CrossRef]

Proc. SPIE (1)

T. Stefaniuk, G. Nowak, and R. Kotynski, Proc. SPIE 8070, 807010 (2011).
[CrossRef]

Science (1)

N. Fang, H. Lee, C. Sun, and X. Zhang, Science 308, 534 (2005).
[CrossRef]

Other (2)

S. M. Durbin, University of Purdue, West Lafayette, Indiana, “AFM roughness data for Ag and ZnO films” (personal communication, 2008).

E. D. Palik, Handbook of Optical Constants of Solids(Academic, 1998).

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