Abstract

We propose a new direct writing nanolithography approach using a plasmonic focusing device and a nano silver mirror with dual-wavelength illumination for high exposure depth. Arrays of pyramid aperture are used to focus the incident light beams into 80 nm light spots. The pyramid combined with a thin silver film coated on the substrate constructs a surface plasmon polaritons (SPP) coupling cavity, which amplifies the intensity of the light field in it by SPP effect and resonance. The transmission depth of the standing wave formed by forward and reflected light could reach hundreds of nanometers. Two lasers with different wavelengths are used as illumination sources to homogenize the light field through complementation between the two standing waves. Simulation results show by using 355 nm and 441 nm wavelengths, a space of 44 nm at the bottom of the photoresist could be obtained after exposure and development. The feature size of resist patterns could be further scaled down, depending on the optimization of parameters of photoresist exposure and development, illumination wavelengths, etc.

© 2012 Optical Society of America

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