Abstract
In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390–785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.
© 2012 Optical Society of America
Full Article | PDF ArticleMore Like This
Yiyu Ou, Valdas Jokubavicius, Philip Hens, Michl Kaiser, Peter Wellmann, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou
Opt. Express 20(7) 7575-7579 (2012)
Yiyu Ou, Imran Aijaz, Valdas Jokubavicius, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou
Opt. Mater. Express 3(1) 86-94 (2013)
Yiyu Ou, Valdas Jokubavicius, Satoshi Kamiyama, Chuan Liu, Rolf W. Berg, Margareta Linnarsson, Rositza Yakimova, Mikael Syväjärvi, and Haiyan Ou
Opt. Mater. Express 1(8) 1439-1446 (2011)