Abstract

For enhancing the micromirror properties like tilting angle and stability during actuation, Fe-based metallic glass (MG) was applied for torsion bar material. A micromirror with mirror-plate diameter of 900μm and torsion bar dimensions length 250μm, width 30μm and thickness 2.5μm was chosen for the tilting angle tests, which were performed by permanent magnets and electromagnet setup. An extremely large tilting angle of over 270° was obtained from an activation test by permanent magnet that has approximately 0.2T of magnetic strength. A large mechanical tilting angle of over 70° was obtained by applying approximately 1.1mT to the mirror when 93mA was applied to solenoid setup. The large-tilting angle of the micromirror is due to the torsion bar, which was fabricated with Fe-based MG thin film that has large elastic strain limit, fracture toughness, and excellent magnetic property.

© 2011 Optical Society of America

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    [CrossRef]

2011

Q. He, Y.-Q. Cheng, E. Ma, and J. Xu, Acta Mater. 59, 202 (2011).
[CrossRef]

2009

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

2007

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

H.-A. Yang, T.-L. Tang, S. T.Lee, and W. Fang, J. Microelectromech. Syst. 16, 511 (2007).
[CrossRef]

2006

J. Schroers and N. Paton, Adv. Mater. Process. 164, 61(2006).

2005

J. Akedo, M. Lebedev, H. Sato, and J. Park, Jpn. J. Appl. Phys. 44, 7072 (2005).
[CrossRef]

2004

J. Schroers and W. L. Johnson, Phys. Rev. Lett. 93, 255506 (2004).
[CrossRef]

Mark Telford, Mater. Today 7, 36 (2004).
[CrossRef]

2002

T. Bourouina, A. Garnier, and H. Fujita, J. Appl. Phys. 91,112 (2002).
[CrossRef]

2000

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

1999

W. L. Johnson, MRS Bull. 24, 42 (1999).

1997

J. W. Judy and R. S. Muller, J. Microelectromech. Syst. 6, 249 (1997).
[CrossRef]

1994

N. Asada, H. Matsuki, K. Minami, and M. Esashi, IEEE Trans. Magn. 30, 4647 (1994).
[CrossRef]

Akedo, J.

J. Akedo, M. Lebedev, H. Sato, and J. Park, Jpn. J. Appl. Phys. 44, 7072 (2005).
[CrossRef]

Asada, N.

N. Asada, H. Matsuki, K. Minami, and M. Esashi, IEEE Trans. Magn. 30, 4647 (1994).
[CrossRef]

Bourouina, T.

T. Bourouina, A. Garnier, and H. Fujita, J. Appl. Phys. 91,112 (2002).
[CrossRef]

Chang, C.

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

Chen, G. L.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

Cheng, Y.-Q.

Q. He, Y.-Q. Cheng, E. Ma, and J. Xu, Acta Mater. 59, 202 (2011).
[CrossRef]

Dürr, P.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

Esashi, M.

N. Asada, H. Matsuki, K. Minami, and M. Esashi, IEEE Trans. Magn. 30, 4647 (1994).
[CrossRef]

Fang, W.

H.-A. Yang, T.-L. Tang, S. T.Lee, and W. Fang, J. Microelectromech. Syst. 16, 511 (2007).
[CrossRef]

Fujita, H.

T. Bourouina, A. Garnier, and H. Fujita, J. Appl. Phys. 91,112 (2002).
[CrossRef]

Garnier, A.

T. Bourouina, A. Garnier, and H. Fujita, J. Appl. Phys. 91,112 (2002).
[CrossRef]

Haase, T.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

He, Q.

Q. He, Y.-Q. Cheng, E. Ma, and J. Xu, Acta Mater. 59, 202 (2011).
[CrossRef]

Hofmann, D. C.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

Hui, X. D.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

Inoue, A.

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

Johnson, W. L.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

J. Schroers and W. L. Johnson, Phys. Rev. Lett. 93, 255506 (2004).
[CrossRef]

W. L. Johnson, MRS Bull. 24, 42 (1999).

Judy, J. W.

J. W. Judy and R. S. Muller, J. Microelectromech. Syst. 6, 249 (1997).
[CrossRef]

Kozachkov, H.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

Kubota, T.

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

Kück, H.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

Kunze, D.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

Lakner, H.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

Launey, M. E.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

Lebedev, M.

J. Akedo, M. Lebedev, H. Sato, and J. Park, Jpn. J. Appl. Phys. 44, 7072 (2005).
[CrossRef]

Lee, S. T.

H.-A. Yang, T.-L. Tang, S. T.Lee, and W. Fang, J. Microelectromech. Syst. 16, 511 (2007).
[CrossRef]

Li, H. X.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

Liu, Y. H.

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Lu, Z. P.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

Ma, E.

Q. He, Y.-Q. Cheng, E. Ma, and J. Xu, Acta Mater. 59, 202 (2011).
[CrossRef]

Makabe, M.

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

Makino, A.

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

Matsuki, H.

N. Asada, H. Matsuki, K. Minami, and M. Esashi, IEEE Trans. Magn. 30, 4647 (1994).
[CrossRef]

Minami, K.

N. Asada, H. Matsuki, K. Minami, and M. Esashi, IEEE Trans. Magn. 30, 4647 (1994).
[CrossRef]

Muller, R. S.

J. W. Judy and R. S. Muller, J. Microelectromech. Syst. 6, 249 (1997).
[CrossRef]

Pan, M. X.

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Park, J.

J. Akedo, M. Lebedev, H. Sato, and J. Park, Jpn. J. Appl. Phys. 44, 7072 (2005).
[CrossRef]

Paton, N.

J. Schroers and N. Paton, Adv. Mater. Process. 164, 61(2006).

Ritchie, R. O.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

Sato, H.

J. Akedo, M. Lebedev, H. Sato, and J. Park, Jpn. J. Appl. Phys. 44, 7072 (2005).
[CrossRef]

Schenk, H.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

Schroers, J.

J. Schroers and N. Paton, Adv. Mater. Process. 164, 61(2006).

J. Schroers and W. L. Johnson, Phys. Rev. Lett. 93, 255506 (2004).
[CrossRef]

Sobe, U.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

Suh, J.-Y.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

Tang, T.-L.

H.-A. Yang, T.-L. Tang, S. T.Lee, and W. Fang, J. Microelectromech. Syst. 16, 511 (2007).
[CrossRef]

Telford, Mark

Mark Telford, Mater. Today 7, 36 (2004).
[CrossRef]

Wang, B. Y.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

Wang, G.

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Wang, R. J.

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Wang, W. H.

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Wu, Y.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

Xu, J.

Q. He, Y.-Q. Cheng, E. Ma, and J. Xu, Acta Mater. 59, 202 (2011).
[CrossRef]

Yang, H.-A.

H.-A. Yang, T.-L. Tang, S. T.Lee, and W. Fang, J. Microelectromech. Syst. 16, 511 (2007).
[CrossRef]

Zhao, D. Q.

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Acta Mater.

Q. He, Y.-Q. Cheng, E. Ma, and J. Xu, Acta Mater. 59, 202 (2011).
[CrossRef]

Adv. Mater. Process.

J. Schroers and N. Paton, Adv. Mater. Process. 164, 61(2006).

Appl. Phys. Lett.

M. E. Launey, D. C. Hofmann, J.-Y. Suh, H. Kozachkov, W. L. Johnson, and R. O. Ritchie, Appl. Phys. Lett. 94, 241910(2009).
[CrossRef]

IEEE J. Sel. Top. Quantum Electron.

H. Schenk, P. Dürr, T. Haase, D. Kunze, U. Sobe, H. Lakner, and H. Kück, IEEE J. Sel. Top. Quantum Electron. 6, 715 (2000).
[CrossRef]

IEEE Trans. Magn.

N. Asada, H. Matsuki, K. Minami, and M. Esashi, IEEE Trans. Magn. 30, 4647 (1994).
[CrossRef]

J. Appl. Phys.

T. Bourouina, A. Garnier, and H. Fujita, J. Appl. Phys. 91,112 (2002).
[CrossRef]

J. Microelectromech. Syst.

J. W. Judy and R. S. Muller, J. Microelectromech. Syst. 6, 249 (1997).
[CrossRef]

H.-A. Yang, T.-L. Tang, S. T.Lee, and W. Fang, J. Microelectromech. Syst. 16, 511 (2007).
[CrossRef]

Jpn. J. Appl. Phys.

J. Akedo, M. Lebedev, H. Sato, and J. Park, Jpn. J. Appl. Phys. 44, 7072 (2005).
[CrossRef]

Mater. Today

Mark Telford, Mater. Today 7, 36 (2004).
[CrossRef]

Mater. Trans. JIM

A. Makino, T. Kubota, C. Chang, M. Makabe, and A. Inoue, Mater. Trans. JIM 48, 3024 (2007).
[CrossRef]

MRS Bull.

W. L. Johnson, MRS Bull. 24, 42 (1999).

Phys. Rev. Lett.

J. Schroers and W. L. Johnson, Phys. Rev. Lett. 93, 255506 (2004).
[CrossRef]

Science

Y. H. Liu, G. Wang, R. J. Wang, D. Q. Zhao, M. X. Pan, and W. H. Wang, Science 315, 1385 (2007).
[CrossRef] [PubMed]

Scr. Mater.

Y. Wu, H. X. Li, G. L. Chen, X. D. Hui, B. Y. Wang, and Z. P. Lu, Scr. Mater. 61, 564 (2009).
[CrossRef]

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Figures (4)

Fig. 1
Fig. 1

Schematic diagram of the mirror structure with Fe-based MG film and patterned Si supporting layer.

Fig. 2
Fig. 2

SEM images of (a) front side and (b) back side view for micromirror structure.

Fig. 3
Fig. 3

Images of the tilting angle of the mirror activated by magnetic field using permanent magnet.

Fig. 4
Fig. 4

Mechanical tilting angle of the mirror as a function of frequency when 93 mA was applied to solenoid setup.

Tables (1)

Tables Icon

Table 1 Sputtering Condition and Properties of MG Film

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