Abstract

A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near $633\mathrm{nm}$ was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained that were essentially opaque at $633\mathrm{nm}$ with little effect on the transmittance of the resist in the UV. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography, and its performance was demonstrated at $633\mathrm{nm}$.

© 2011 Optical Society of America

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