Abstract

A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633nm was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained that were essentially opaque at 633nm with little effect on the transmittance of the resist in the UV. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography, and its performance was demonstrated at 633nm.

© 2011 Optical Society of America

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References

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2008 (1)

C. Pruss, E. Garbusi, and W. Osten, Opt. Photonics News 19(4), 24 (2008).
[CrossRef]

2007 (3)

2006 (2)

2004 (1)

C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004).
[CrossRef]

2003 (1)

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

1994 (2)

D. Kunze and R. Pforr, Microelectron. Eng. 25, 3 (1994).
[CrossRef]

J. H. Burge, Proc. SPIE 1994, 248 (1994).
[CrossRef]

1988 (1)

C. A. Mack, Solid State Technol. 31, 125 (1988).

1983 (1)

1977 (1)

1974 (2)

1971 (1)

1970 (1)

1967 (1)

1966 (1)

Beesley, M. J.

Biedermann, K.

Brown, B. R.

Burge, J. H.

Case, S. K.

Castledine, J. G.

Chang, Y.-C.

DiMenna, B.

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

Enger, R. C.

Flaim, T.

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

Garbusi, E.

C. Pruss, E. Garbusi, and W. Osten, Opt. Photonics News 19(4), 24 (2008).
[CrossRef]

Guerrero, D. J.

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

Henton, R. F.

Holmgren, O.

Iwata, F.

Kunze, D.

D. Kunze and R. Pforr, Microelectron. Eng. 25, 3 (1994).
[CrossRef]

Lohmann, A. W.

MacGovern, A. J.

Mack, C. A.

C. A. Mack, Solid State Technol. 31, 125 (1988).

Mercado, R.

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

Osten, W.

C. Pruss, E. Garbusi, and W. Osten, Opt. Photonics News 19(4), 24 (2008).
[CrossRef]

C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004).
[CrossRef]

Paris, D. P.

Pforr, R.

D. Kunze and R. Pforr, Microelectron. Eng. 25, 3 (1994).
[CrossRef]

Pruss, C.

C. Pruss, E. Garbusi, and W. Osten, Opt. Photonics News 19(4), 24 (2008).
[CrossRef]

C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004).
[CrossRef]

Ransom, P. L.

Reichelt, S.

C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004).
[CrossRef]

Sun, S.

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

Tiziani, H.

C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004).
[CrossRef]

Tsujiuchi, J.

Veldkamp, W. B.

W. B. Veldkamp, Jpn. J. Appl. Phys. 45, 6550 (2006).
[CrossRef]

Wyant, J. C.

Zhou, P.

Zollinger, H.

H. Zollinger, Color Chemistry, 3rd ed. (Wiley, 2001).

Appl. Opt. (10)

J. Opt. Soc. Am. (1)

Jpn. J. Appl. Phys. (1)

W. B. Veldkamp, Jpn. J. Appl. Phys. 45, 6550 (2006).
[CrossRef]

Microelectron. Eng. (1)

D. Kunze and R. Pforr, Microelectron. Eng. 25, 3 (1994).
[CrossRef]

Opt. Eng. (1)

C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004).
[CrossRef]

Opt. Express (1)

Opt. Photonics News (1)

C. Pruss, E. Garbusi, and W. Osten, Opt. Photonics News 19(4), 24 (2008).
[CrossRef]

Proc. SPIE (2)

D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003).
[CrossRef]

J. H. Burge, Proc. SPIE 1994, 248 (1994).
[CrossRef]

Solid State Technol. (1)

C. A. Mack, Solid State Technol. 31, 125 (1988).

Other (3)

H. Zollinger, Color Chemistry, 3rd ed. (Wiley, 2001).

“Data sheet for Epolin Epolight 5262 dye,” http://www.epolin.com (April 28, 2011).

“Data sheet for Rohm and Haas/Shipley MICROPOSIT S1800 Series Photoresists,” http://www.epolin.com (April 28, 2011).

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Figures (6)

Fig. 1
Fig. 1

Relative absorbances of Epolight 5262 dye dissolved in acetone (dash-dotted curve), of unexposed S1813 photoresist (solid curve), and of exposed S1813 photoresist (dashed curve).

Fig. 2
Fig. 2

Absorbance of 1.8 μm thick photoresist layers containing different concentrations of dye. The uncertainty ( 1 σ ) of the absorbances is 0.025, or 2.5%.

Fig. 3
Fig. 3

Absorbance of fully exposed, undeveloped photoresist with and without dye.

Fig. 4
Fig. 4

Absorbance of unexposed, developed photoresist with and without dye.

Fig. 5
Fig. 5

Scanning electron microscope image of a Fresnel zone plate made from dyed photoresist. The scale bar represents a distance of 500 μm .

Fig. 6
Fig. 6

Focusing of a collimated laser beam with wavelength of 633 nm by a Fresnel zone plate with 100 mm primary focal length made from dyed photoresist.

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