Abstract

An interesting method to fabricate submicrometer gratings (SMGs) utilizing the interference of surface plasmon waves (SPWs) is presented. The stationary wave field off the aluminum (Al) layer surface of an Al-covered UV fiber core, formed by the interference of the induced SPWs, has been employed as a submicrometer photolithography tool to inscribe SMGs on the surface of a self-processing hybrid HfO2/SiO2 solgel film. Using atomic force microscopy, the period of the fabricated SMGs was measured as 105nm. The intensity distribution of the stationary wave field was measured by a near-field scanning optical microscope and anastomosed with theoretical values calculated by using FDTD simulations.

© 2010 Optical Society of America

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References

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  1. N. F. Borrelli, Microoptics Technology (Marcel Dekker, 2005).
  2. X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
    [CrossRef]
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    [CrossRef] [PubMed]
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    [CrossRef]
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    [CrossRef]
  12. J. C. Martinez-Anton, Pure Appl. Opt. 8, S213 (2006).
    [CrossRef]

2010 (1)

2006 (2)

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

J. C. Martinez-Anton, Pure Appl. Opt. 8, S213 (2006).
[CrossRef]

2005 (3)

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, Appl. Phys. A 80, 433 (2005).
[CrossRef]

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

2004 (3)

M. He, X.-C. Yuan, J. Bu, and W. C. Cheong, Opt. Lett. 29, 1007 (2004).
[CrossRef] [PubMed]

B. S. Bae, J. Sol-Gel Sci. Technol. 31, 309 (2004).
[CrossRef]

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

2003 (1)

2000 (1)

J. T. Rantala, R. Levy, L. Kivimäki, and M. R. Descour, Electron. Lett. 36, 530 (2000).
[CrossRef]

Bae, B. S.

B. S. Bae, J. Sol-Gel Sci. Technol. 31, 309 (2004).
[CrossRef]

Balogh, D. T.

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

Böhme, R.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, Appl. Phys. A 80, 433 (2005).
[CrossRef]

Borrelli, N. F.

N. F. Borrelli, Microoptics Technology (Marcel Dekker, 2005).

Bu, J.

Cheong, W. C.

Chin, M. K.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Descour, M. R.

J. T. Rantala, R. Levy, L. Kivimäki, and M. R. Descour, Electron. Lett. 36, 530 (2000).
[CrossRef]

Ding, X.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

dos Santos, D. S.

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

He, A. H.

He, M.

Hoshiyama, S.

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Kaneko, F.

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Kato, K.

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Kawaguchi, Y.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

Kawakami, T.

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Kivimäki, L.

J. T. Rantala, R. Levy, L. Kivimäki, and M. R. Descour, Electron. Lett. 36, 530 (2000).
[CrossRef]

Kudryashov, V.

Kurosaki, R.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

Lee, S. Y.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Levy, R.

J. T. Rantala, R. Levy, L. Kivimäki, and M. R. Descour, Electron. Lett. 36, 530 (2000).
[CrossRef]

Li, S. T.

Li, Y.

Low, D. K. Y.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Lu, A. C. W.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Martinez-Anton, J. C.

J. C. Martinez-Anton, Pure Appl. Opt. 8, S213 (2006).
[CrossRef]

Mendonca, C. R.

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

Narazaki, A.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

Ngo, N. Q.

Niino, H.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

Ohdaira, Y.

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Oliveira, O. N.

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

Plante, P.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Qian, M.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Rantala, J. T.

J. T. Rantala, R. Levy, L. Kivimäki, and M. R. Descour, Electron. Lett. 36, 530 (2000).
[CrossRef]

Rauschenbach, B.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, Appl. Phys. A 80, 433 (2005).
[CrossRef]

Sato, T.

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

Shinbo, K.

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Wang, W. J.

Xing, H. Y.

Yuan, X.-C.

Zajadacz, J.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, Appl. Phys. A 80, 433 (2005).
[CrossRef]

Zeng, X. T.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Zhang, X.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Zhao, Z. Q.

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

Zimmer, K.

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, Appl. Phys. A 80, 433 (2005).
[CrossRef]

Zucolotto, V.

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

Adv. Collid Interface Sci. (1)

O. N. Oliveira, D. S. dos Santos, D. T. Balogh, V. Zucolotto, and C. R. Mendonca, Adv. Collid Interface Sci. 116, 179 (2005).
[CrossRef]

Appl. Phys. A (1)

R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, Appl. Phys. A 80, 433 (2005).
[CrossRef]

Appl. Phys. Lett. (1)

Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
[CrossRef]

Electron. Lett. (1)

J. T. Rantala, R. Levy, L. Kivimäki, and M. R. Descour, Electron. Lett. 36, 530 (2000).
[CrossRef]

J. Cryst. Growth (1)

X. Zhang, Z. Q. Zhao, M. Qian, S. Y. Lee, M. K. Chin, X. T. Zeng, D. K. Y. Low, A. C. W. Lu, and P. Plante, J. Cryst. Growth 288, 176 (2006).
[CrossRef]

J. Lightwave Technol. (1)

J. Photochem. Photobiol. A (1)

X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, and H. Niino, J. Photochem. Photobiol. A 166, 129 (2004).
[CrossRef]

J. Sol-Gel Sci. Technol. (1)

B. S. Bae, J. Sol-Gel Sci. Technol. 31, 309 (2004).
[CrossRef]

Opt. Lett. (2)

Pure Appl. Opt. (1)

J. C. Martinez-Anton, Pure Appl. Opt. 8, S213 (2006).
[CrossRef]

Other (1)

N. F. Borrelli, Microoptics Technology (Marcel Dekker, 2005).

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Figures (4)

Fig. 1
Fig. 1

Schematic diagram of the three-layer fiber-based setup for interference of SPWs as a lithography tool.

Fig. 2
Fig. 2

FDTD simulations of the intensity distribution of the stationary wave field on the xz plane off the Al layer surface.

Fig. 3
Fig. 3

NSOM image of the intensity distribution of the stationary wave field off the Al layer surface.

Fig. 4
Fig. 4

AFM image of the fabricated SMG on the surface of solgel film.

Equations (1)

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d = 2 π / Re ( 2 k sp ) = 2 π / ( 2 k z ) = λ / ( 2 n sin θ sp ) .

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