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Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform

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Abstract

We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3to1.5μm with three channels located at 1310, 1490, and 1550nm and with a footprint of 150μm×130μm.

© 2009 Optical Society of America

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