Abstract

We have studied the effect of oxidation on the propagation loss and surface roughness of silicon-on-oxidized-porous-silicon strip waveguides fabricated using proton-beam irradiation and electrochemical etching. A thin thermal oxide is formed around the core of the waveguide, enabling the symmetric reduction of core size and roughness on all sides. Significant loss reduction from about 10dBcmto1dBcm has been obtained in TE and TM polarizations after oxidation smoothening of both the bottom and the sidewalls by 20nm. This corresponds well with simulations using the beam-propagation method that show significant contributions from both surfaces.

© 2009 Optical Society of America

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