Abstract

Femtosecond laser pulses were used to make plasma filaments near an isolated positively or negatively highly biased electrode. The electrode was well positioned to sustain a high voltage up to Umax=±400kV to avoid the induced breakdown or a glow discharge; the shape of the electrode was chosen to reduce the corona effects at the maximal voltage. The filament’s UV emission is shown to be very sensitive to the voltage applied: it increases nonlinearly with the electrode potential. Along with nanosecond filament-induced flashes at both polarities, long, about a half microsecond, corona flashes were observed at the negative polarity.

© 2009 Optical Society of America

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References

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2008

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

A. Houard, Y. Liu, B. Prade, V. T. Tikhonchuk, and A. Mysyrowicz, Phys. Rev. Lett. 100, 255006 (2008).
[CrossRef] [PubMed]

J. Kasparian, R. Ackermann, Y.-B. André, G. Méchain, G. Méjean, B. Prade, P. Rohwetter, E. Salmon, K. Stelmaszczyk, J. Yu, A. Mysyrowicz, R. Sauerbrey, L. Wöste, and J.-P. Wolf, Opt. Express 16, 5757 (2008).
[CrossRef] [PubMed]

2007

A. Couairon and A. Mysyrowicz, Phys. Rep. 441, 47 (2007).
[CrossRef]

2006

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

2005

S. Champeaux and L. Bergé, Phys. Rev. E 71, 046604 (2005).
[CrossRef]

2002

1995

Ackermann, R.

André, Y.-B.

Becker, A.

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

Bergé, L.

S. Champeaux and L. Bergé, Phys. Rev. E 71, 046604 (2005).
[CrossRef]

Braun, A.

Champeaux, S.

S. Champeaux and L. Bergé, Phys. Rev. E 71, 046604 (2005).
[CrossRef]

Chen, Z.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Chin, S. L.

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

S. L. Chin, in Advances in Multi-photon Processes and Spectroscopy, S.H.Lin, A.A.Villaeys, and Y.Fujimura, eds. (World Scientific, 2004), pp. 249-272.
[CrossRef]

Couairon, A.

A. Couairon and A. Mysyrowicz, Phys. Rep. 441, 47 (2007).
[CrossRef]

Du, D.

Fujii, T.

Fukuchi, T.

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Goto, N.

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Houard, A.

A. Houard, Y. Liu, B. Prade, V. T. Tikhonchuk, and A. Mysyrowicz, Phys. Rev. Lett. 100, 255006 (2008).
[CrossRef] [PubMed]

Kalkner, W.

Kasparian, J.

Klingbeil, L.

Korn, G.

Li, Y.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Liu, W.

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

Liu, X.

Liu, Y.

A. Houard, Y. Liu, B. Prade, V. T. Tikhonchuk, and A. Mysyrowicz, Phys. Rev. Lett. 100, 255006 (2008).
[CrossRef] [PubMed]

Méchain, G.

Méjean, G.

Miki, M.

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Mourou, G.

Mysyrowicz, A.

Nemoto, K.

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Oishi, Y.

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Prade, B.

Raizer, Y. P.

Y. P. Raizer, Gas Discharge Physics (Springer-Verlag, 1991). pp. 60-63.

Rethmeier, K.

Rodriguez, M.

Rohwetter, P.

Salmon, E.

Sauerbrey, R.

Sheng, Z.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Simard, P. Tr.

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

Squier, J.

Stelmaszczyk, K.

Teng, H.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Théberge, F.

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

Tikhonchuk, V. T.

A. Houard, Y. Liu, B. Prade, V. T. Tikhonchuk, and A. Mysyrowicz, Phys. Rev. Lett. 100, 255006 (2008).
[CrossRef] [PubMed]

Wei, Z.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Wille, H.

Wolf, J.-P.

Wöste, L.

Yang, H.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Yu, J.

Zhang, J.

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Zhidkov, A.

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Opt. Express

Opt. Lett.

Phys. Plasmas

T. Fujii, M. Miki, N. Goto, A. Zhidkov, T. Fukuchi, Y. Oishi, and K. Nemoto, Phys. Plasmas 15, 013107 (2008).
[CrossRef]

Phys. Rep.

A. Couairon and A. Mysyrowicz, Phys. Rep. 441, 47 (2007).
[CrossRef]

Phys. Rev. E

S. Champeaux and L. Bergé, Phys. Rev. E 71, 046604 (2005).
[CrossRef]

F. Théberge, W. Liu, P. Tr. Simard, A. Becker, and S. L. Chin, Phys. Rev. E 74, 036406 (2006).
[CrossRef]

H. Yang, J. Zhang, Y. Li, J. Zhang, Y. Li, Z. Chen, H. Teng, Z. Wei, and Z. Sheng, Phys. Rev. E 66, 016406 (2002).
[CrossRef]

Phys. Rev. Lett.

A. Houard, Y. Liu, B. Prade, V. T. Tikhonchuk, and A. Mysyrowicz, Phys. Rev. Lett. 100, 255006 (2008).
[CrossRef] [PubMed]

Other

Y. P. Raizer, Gas Discharge Physics (Springer-Verlag, 1991). pp. 60-63.

S. L. Chin, in Advances in Multi-photon Processes and Spectroscopy, S.H.Lin, A.A.Villaeys, and Y.Fujimura, eds. (World Scientific, 2004), pp. 249-272.
[CrossRef]

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Figures (3)

Fig. 1
Fig. 1

Experimental setup.

Fig. 2
Fig. 2

UV images in the vicinity of the HVE and filament at each applied voltage for (a) positive polarity and each gate delay time of ICCD camera at (b) +400 kV and (c) −400 kV. The gate delay time, gate width, and gain of ICCD camera for the experiments shown in (a) were 0 ns, 650 ns, and 200, respectively. The gate width of ICCD camera for the experiments shown in (b) and (c) was 50 ns, and its gain was 200 and 100 in (b) and (c), respectively. The intensity of UV emission was shown by color; the white color shows the higher brightness.

Fig. 3
Fig. 3

(a) Time-dependencies of UV signal in the vicinity of the HVE and filament for the wavelengths of 313.6 nm, 315.9 nm, and 337.1 nm with the applied voltage of +400 kV (notated as positive) or −400 kV (notated as negative) and (b) dependencies of the signal height for 337.1 nm on the applied voltage for the negative and positive polarities. The UV signal without the laser shot was subtracted from the UV signal of the LFP. The gate width of the ICCD camera for the experiments shown in (a) was 50 ns, and those at positive and negative polarities in (b) were 50 ns and 500 ns, respectively. The integrated UV emission power weakly depends on the gate width: the initial UV flash is the most powerful. The gate delay time of the ICCD camera for the experiments shown in (b) was 0 ns and 15 ns for the positive and negative polarities, respectively; the ICCD camera gate opened to detect before filament formation even in case of the negative polarity. ICCD gain was 250 for all experiments. The inset in (a) is the UV spectra at several gate delay times of the ICCD camera for negative polarity.

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