Abstract

SiGd multilayers designed as narrowband reflective coatings near 63nm were developed. The highest peak reflectance of 26.2% at a 5° incident angle was obtained at 62nm, and the spectral bandwidth was 7.3nm FWHM. The fits for x-ray and extreme ultraviolet reflectance data of SiGd multilayers indicate the possibility of silicide formation at the SiGd interfaces. B4C, W, and SiN were deposited as interface barrier layers to improve the reflectance of SiGd multilayers. More than an 8% increase in reflectance was observed from the interface-engineered SiWGd and SiB4CGd multilayers.

© 2008 Optical Society of America

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