Abstract

We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purity-enhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer.

© 2008 Optical Society of America

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  1. V. Banine and R. Moors, J. Phys. D 37, 3207 (2004).
    [CrossRef]
  2. J. Jonkers, Plasma Sources Sci. Technol. 15, S8 (2006).
    [CrossRef]
  3. R. L. Brainard, C. Henderson, J. Cobb, V. Rao, J. F. Mackevich, U. Okoroanyanwu, S. Gunn, J. Chambers, and S. Connolly, J. Vac. Sci. Technol. B 17, 3384 (1999).
    [CrossRef]
  4. R. H. Stulen and D. W. Sweeney, IEEE J. Quantum Electron. 35, 694 (1999).
    [CrossRef]
  5. L. Shmaenok, N. N. Salashchenko, V. I. Luchin, A. Ya. Lopatin, and N. N. Zybin, EUV Sematech EUV Source Workshop, Barcelona (2006).
  6. I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, Opt. Commun. 102, 401 (1993).
  7. P. P. Naulleau, W. C. Sweatt, and D. A. Tichenor, Opt. Commun. 214, 31 (2002).
    [CrossRef]
  8. J. A. Liddle, F. Salmassi, P. P. Naulleau, and E. M. Gullikson, J. Vac. Sci. Technol. B 212980 (2003).
    [CrossRef]
  9. E.D.Palik, ed., Handbook of Optical Constants of Solids (Academic, 1985).
  10. E. Louis, H. J. Voorma, K. B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y. Y. Platonov, G. E. Vandorssen, and H. A. Padmore, Microelectron. Eng. 23, 215 (1994).
    [CrossRef]
  11. E. Spiller, Soft X-ray Optics (SPIE Optical Engineering Press, 1994), p. 170.
  12. R. Schlatmann, S. Lu, J. Verhoeven, E. J. Puik, and M. J. van der Wiel, Appl. Surf. Sci. 78, 147 (1994).
    [CrossRef]
  13. A. Gottwald, U. Kroth, M. Letz, H. Schoeppe, and M. Richter, Proc. SPIE 5538, 157 (2004).
  14. R. Stuik, F. Scholze, J. Tummler, and F. Bijkerk, Nucl. Instrum. Methods Phys. Res. A 492305 (2002).
    [CrossRef]
  15. D. L. Windt, Comput. Phys. 12, 360 (1998).
    [CrossRef]

2006 (1)

J. Jonkers, Plasma Sources Sci. Technol. 15, S8 (2006).
[CrossRef]

2004 (2)

V. Banine and R. Moors, J. Phys. D 37, 3207 (2004).
[CrossRef]

A. Gottwald, U. Kroth, M. Letz, H. Schoeppe, and M. Richter, Proc. SPIE 5538, 157 (2004).

2003 (1)

J. A. Liddle, F. Salmassi, P. P. Naulleau, and E. M. Gullikson, J. Vac. Sci. Technol. B 212980 (2003).
[CrossRef]

2002 (2)

P. P. Naulleau, W. C. Sweatt, and D. A. Tichenor, Opt. Commun. 214, 31 (2002).
[CrossRef]

R. Stuik, F. Scholze, J. Tummler, and F. Bijkerk, Nucl. Instrum. Methods Phys. Res. A 492305 (2002).
[CrossRef]

1999 (2)

R. L. Brainard, C. Henderson, J. Cobb, V. Rao, J. F. Mackevich, U. Okoroanyanwu, S. Gunn, J. Chambers, and S. Connolly, J. Vac. Sci. Technol. B 17, 3384 (1999).
[CrossRef]

R. H. Stulen and D. W. Sweeney, IEEE J. Quantum Electron. 35, 694 (1999).
[CrossRef]

1998 (1)

D. L. Windt, Comput. Phys. 12, 360 (1998).
[CrossRef]

1994 (2)

E. Louis, H. J. Voorma, K. B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y. Y. Platonov, G. E. Vandorssen, and H. A. Padmore, Microelectron. Eng. 23, 215 (1994).
[CrossRef]

R. Schlatmann, S. Lu, J. Verhoeven, E. J. Puik, and M. J. van der Wiel, Appl. Surf. Sci. 78, 147 (1994).
[CrossRef]

1993 (1)

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, Opt. Commun. 102, 401 (1993).

Appl. Surf. Sci. (1)

R. Schlatmann, S. Lu, J. Verhoeven, E. J. Puik, and M. J. van der Wiel, Appl. Surf. Sci. 78, 147 (1994).
[CrossRef]

Comput. Phys. (1)

D. L. Windt, Comput. Phys. 12, 360 (1998).
[CrossRef]

IEEE J. Quantum Electron. (1)

R. H. Stulen and D. W. Sweeney, IEEE J. Quantum Electron. 35, 694 (1999).
[CrossRef]

J. Phys. D (1)

V. Banine and R. Moors, J. Phys. D 37, 3207 (2004).
[CrossRef]

J. Vac. Sci. Technol. B (2)

J. A. Liddle, F. Salmassi, P. P. Naulleau, and E. M. Gullikson, J. Vac. Sci. Technol. B 212980 (2003).
[CrossRef]

R. L. Brainard, C. Henderson, J. Cobb, V. Rao, J. F. Mackevich, U. Okoroanyanwu, S. Gunn, J. Chambers, and S. Connolly, J. Vac. Sci. Technol. B 17, 3384 (1999).
[CrossRef]

Microelectron. Eng. (1)

E. Louis, H. J. Voorma, K. B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y. Y. Platonov, G. E. Vandorssen, and H. A. Padmore, Microelectron. Eng. 23, 215 (1994).
[CrossRef]

Nucl. Instrum. Methods Phys. Res. A (1)

R. Stuik, F. Scholze, J. Tummler, and F. Bijkerk, Nucl. Instrum. Methods Phys. Res. A 492305 (2002).
[CrossRef]

Opt. Commun. (2)

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, Opt. Commun. 102, 401 (1993).

P. P. Naulleau, W. C. Sweatt, and D. A. Tichenor, Opt. Commun. 214, 31 (2002).
[CrossRef]

Plasma Sources Sci. Technol. (1)

J. Jonkers, Plasma Sources Sci. Technol. 15, S8 (2006).
[CrossRef]

Proc. SPIE (1)

A. Gottwald, U. Kroth, M. Letz, H. Schoeppe, and M. Richter, Proc. SPIE 5538, 157 (2004).

Other (3)

E. Spiller, Soft X-ray Optics (SPIE Optical Engineering Press, 1994), p. 170.

L. Shmaenok, N. N. Salashchenko, V. I. Luchin, A. Ya. Lopatin, and N. N. Zybin, EUV Sematech EUV Source Workshop, Barcelona (2006).

E.D.Palik, ed., Handbook of Optical Constants of Solids (Academic, 1985).

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