Abstract

We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An MoSi multilayer-coated specimen with a blaze angle of 1.9° was fabricated and measured. At an incident angle of 10° and a wavelength of 13.62nm, the diffraction efficiency of the negative second order reaches 36.2%.

© 2008 Optical Society of America

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References

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2006 (1)

2004 (1)

2001 (1)

B. Nelles, K. F. Heidemann, and B. Kleemann, Nucl. Instrum. Methods Phys. Res. A 467-468, 260 (2001).
[CrossRef]

1998 (1)

1995 (2)

1991 (1)

1988 (1)

L. Li, M. Xu, G. I. Stegeman, and C. T. Seaton, Proc. SPIE 835, 72 (1988).

1979 (1)

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Figures (3)

Fig. 1
Fig. 1

Typical AFM-measured average groove profile and the designed groove profile. Closed square, designed; closed circle, measured before multilayer coating; plus, measured after multilayer coating. The inset is an AFM image before multilayer coating. The X axis is perpendicular to the orientation of the grating groove, the Y axis is parallel to the groove, and the Z axis is along the normal of the grating plane.

Fig. 2
Fig. 2

Diffraction efficiency angular spectrum of the Mo Si multilayer-coated blaze grating at a 10 ° incident angle and a 13.62 nm wavelength.

Fig. 3
Fig. 3

Measured and calculated negative second-order diffraction efficiencies versus wavelength at an incident angle of 10 ° . Squared solid curve, measured; dashed curve, calculated, designed ideal groove profile; dashed-dotted curve, calculated, measured actual profile.

Tables (1)

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Table 1 Designed and Measured Grating Parameters a

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