Abstract

We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An MoSi multilayer-coated specimen with a blaze angle of 1.9° was fabricated and measured. At an incident angle of 10° and a wavelength of 13.62nm, the diffraction efficiency of the negative second order reaches 36.2%.

© 2008 Optical Society of America

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