We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An multilayer-coated specimen with a blaze angle of was fabricated and measured. At an incident angle of and a wavelength of , the diffraction efficiency of the negative second order reaches 36.2%.
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