Abstract

Ultraviolet $(\lambda =248\mathrm{nm})$ excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of $100\mathrm{\mu }\mathrm{m}$ wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to $310\mathrm{nm}$ for fluences of 12 and $192\mathrm{J}∕{\mathrm{cm}}^2$, respectively. Moreover, the surface profile of the film surface at fluences greater than $12\mathrm{J}∕{\mathrm{cm}}^2$ was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

© 2008 Optical Society of America

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