Abstract

The optical near field and its polarization anisotropy in transparent nanostructures were studied by polarization near-field optical microscopy. From experimental results and finite-difference time-domain calculations, we conclude that localized optical near fields exist at topographically higher regions of nanostructures under the TE-polarization condition. Optical near fields with a feature size smaller than 100nm are applied for contact photomask lithography. We demonstrate photolithographic patterns with 80nm width by using a 442nm helium cadmium laser.

© 2006 Optical Society of America

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