Abstract

We demonstrate a high-throughput, high-damage-threshold beam separator for wavelengths shorter than 30nm, which uses a 10nm thick niobium nitrogen film prepared on a Si substrate, set at the Brewster angle relative to the pump wavelength. The film was deposited by rf reactive magnetron sputtering on a Si substrate. The beam separator has an attenuation ratio of 0.01 and a damage-threshold intensity of at least 0.8TWcm2 for a 26fs pump pulse. The measured reflectivity of the beam separator exceeded 70% in a wavelength range of 1318nm. This broadband beam separator may be used to eliminate energetic laser pulses from longitudinally pumped x ray lasers as well as from high-order harmonics.

© 2006 Optical Society of America

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