Abstract

We report what is to our knowledge the first photochemical fabrication of a long-period grating in a pure-fused-silica photonic crystal fiber. The inscription technique is based on a two-photon absorption mechanism and does not require a specially designed photonic crystal fiber with a photosensitive Ge-doped core. The characteristic fluence value for the inscription is an order of magnitude less than that for a standard telecom fiber irradiated under similar conditions with the same grating parameters.

© 2006 Optical Society of America

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