Abstract

Large-area surface-plasmon polariton (SPP) interference lithography is presented, which uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finite-difference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of 441nm can produce features as small as 60nm with high contrast, smaller than λ7. Our results illustrate the potential for patterning periodic structures over large areas at low cost.

© 2006 Optical Society of America

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