Large-area surface-plasmon polariton interference lithography

Abstract

Large-area surface-plasmon polariton (SPP) interference lithography is presented, which uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finite-difference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of $441\mathrm{nm}$ can produce features as small as $60\mathrm{nm}$ with high contrast, smaller than $\lambda ∕7$. Our results illustrate the potential for patterning periodic structures over large areas at low cost.

© 2006 Optical Society of America

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