Abstract

The recording of holographic reflection gratings with a spatial frequency higher than 5400  linesmm in photopolymerizable solgel materials is experimentally demonstrated. Diffraction efficiencies near 60% and a FWHM of 2.5nm centered at 531.5nm are achieved. Moreover, the effect of the energetic exposure is characterized at different recording intensities.

© 2006 Optical Society of America

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  1. L. Hesselink, S. S. Orlov, and M. C. Bashaw, Proc. IEEE 92, 1231 (2004).
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2005 (2)

2004 (3)

2002 (1)

N. Suzuki, Y. Tomita, and T. Kojima, Appl. Phys. Lett. 81, 4121 (2002).
[CrossRef]

2001 (3)

P. Cheben and M. L. Calvo, Appl. Phys. Lett. 78, 1490 (2001).
[CrossRef]

S. Orlic, S. Ulm, and H. J. Eichler, J. Opt. A, Pure Appl. Opt. 3, 72 (2001).
[CrossRef]

G. Zhang, G. Montemezzani, and P. Günter, Appl. Opt. 40, 2423 (2001).
[CrossRef]

1999 (2)

1998 (1)

1996 (1)

1969 (1)

H. Kogelnik, Bell Syst. Tech. J. 48, 2909 (1969).

Álvarez-Herrero, A.

Bashaw, M. C.

L. Hesselink, S. S. Orlov, and M. C. Bashaw, Proc. IEEE 92, 1231 (2004).
[CrossRef]

Belenguer, T.

Blaya, S.

A. Murciano, S. Blaya, L. Carretero, M. Ulibarrena, and A. Fimia, Appl. Phys. B 81, 167 (2005).
[CrossRef]

L. Carretero, A. Murciano, S. Blaya, M. Ulibarrena, and A. Fimia, Opt. Express 12, 1780 (2004).
[CrossRef] [PubMed]

Butler, C. J.

D. A. Waldman, C. J. Butler, and D. H. Raguin, in Proc. SPIE 5216, 178 (2003).

Calvo, M. L.

P. Cheben and M. L. Calvo, Appl. Phys. Lett. 78, 1490 (2001).
[CrossRef]

Carretero, L.

A. Murciano, S. Blaya, L. Carretero, M. Ulibarrena, and A. Fimia, Appl. Phys. B 81, 167 (2005).
[CrossRef]

L. Carretero, A. Murciano, S. Blaya, M. Ulibarrena, and A. Fimia, Opt. Express 12, 1780 (2004).
[CrossRef] [PubMed]

Cheben, P.

Daiber, A. J.

del Monte, F.

Dhar, L.

Eichler, H. J.

S. Orlic, S. Ulm, and H. J. Eichler, J. Opt. A, Pure Appl. Opt. 3, 72 (2001).
[CrossRef]

Fimia, A.

A. Murciano, S. Blaya, L. Carretero, M. Ulibarrena, and A. Fimia, Appl. Phys. B 81, 167 (2005).
[CrossRef]

L. Carretero, A. Murciano, S. Blaya, M. Ulibarrena, and A. Fimia, Opt. Express 12, 1780 (2004).
[CrossRef] [PubMed]

Günter, P.

Hesselink, L.

Kogelnik, H.

H. Kogelnik, Bell Syst. Tech. J. 48, 2909 (1969).

Kojima, T.

N. Suzuki, Y. Tomita, and T. Kojima, Appl. Phys. Lett. 81, 4121 (2002).
[CrossRef]

Levy, D.

Lu, Y.

C. Wang, Y. Zhang, Y. Lu, and Y. Way, J. Mater. Res. 14, 4098 (1999).
[CrossRef]

McDonald, M. E.

McLeod, R. R.

Montemezzani, G.

Murciano, A.

A. Murciano, S. Blaya, L. Carretero, M. Ulibarrena, and A. Fimia, Appl. Phys. B 81, 167 (2005).
[CrossRef]

L. Carretero, A. Murciano, S. Blaya, M. Ulibarrena, and A. Fimia, Opt. Express 12, 1780 (2004).
[CrossRef] [PubMed]

Nonaka, K.

Nunez, A.

Orlic, S.

S. Orlic, S. Ulm, and H. J. Eichler, J. Opt. A, Pure Appl. Opt. 3, 72 (2001).
[CrossRef]

Orlov, S. S.

L. Hesselink, S. S. Orlov, and M. C. Bashaw, Proc. IEEE 92, 1231 (2004).
[CrossRef]

Patel, S.

Raguin, D. H.

D. A. Waldman, C. J. Butler, and D. H. Raguin, in Proc. SPIE 5216, 178 (2003).

Ramos, G.

Robertson, T.

Schilling, M. L.

Schnoes, M. G.

Single, T.

Sochava, S. L.

Suzuki, N.

N. Suzuki, Y. Tomita, and T. Kojima, Appl. Phys. Lett. 81, 4121 (2002).
[CrossRef]

Tomita, Y.

N. Suzuki, Y. Tomita, and T. Kojima, Appl. Phys. Lett. 81, 4121 (2002).
[CrossRef]

Ulibarrena, M.

A. Murciano, S. Blaya, L. Carretero, M. Ulibarrena, and A. Fimia, Appl. Phys. B 81, 167 (2005).
[CrossRef]

L. Carretero, A. Murciano, S. Blaya, M. Ulibarrena, and A. Fimia, Opt. Express 12, 1780 (2004).
[CrossRef] [PubMed]

Ulm, S.

S. Orlic, S. Ulm, and H. J. Eichler, J. Opt. A, Pure Appl. Opt. 3, 72 (2001).
[CrossRef]

Waldman, D. A.

D. A. Waldman, C. J. Butler, and D. H. Raguin, in Proc. SPIE 5216, 178 (2003).

Wang, C.

C. Wang, Y. Zhang, Y. Lu, and Y. Way, J. Mater. Res. 14, 4098 (1999).
[CrossRef]

Way, Y.

C. Wang, Y. Zhang, Y. Lu, and Y. Way, J. Mater. Res. 14, 4098 (1999).
[CrossRef]

Wiltzius, P.

Zhang, G.

Zhang, Y.

C. Wang, Y. Zhang, Y. Lu, and Y. Way, J. Mater. Res. 14, 4098 (1999).
[CrossRef]

Appl. Opt. (4)

Appl. Phys. B (1)

A. Murciano, S. Blaya, L. Carretero, M. Ulibarrena, and A. Fimia, Appl. Phys. B 81, 167 (2005).
[CrossRef]

Appl. Phys. Lett. (2)

N. Suzuki, Y. Tomita, and T. Kojima, Appl. Phys. Lett. 81, 4121 (2002).
[CrossRef]

P. Cheben and M. L. Calvo, Appl. Phys. Lett. 78, 1490 (2001).
[CrossRef]

Bell Syst. Tech. J. (1)

H. Kogelnik, Bell Syst. Tech. J. 48, 2909 (1969).

J. Mater. Res. (1)

C. Wang, Y. Zhang, Y. Lu, and Y. Way, J. Mater. Res. 14, 4098 (1999).
[CrossRef]

J. Opt. A, Pure Appl. Opt. (1)

S. Orlic, S. Ulm, and H. J. Eichler, J. Opt. A, Pure Appl. Opt. 3, 72 (2001).
[CrossRef]

Opt. Express (1)

Opt. Lett. (2)

Proc. IEEE (1)

L. Hesselink, S. S. Orlov, and M. C. Bashaw, Proc. IEEE 92, 1231 (2004).
[CrossRef]

Other (1)

D. A. Waldman, C. J. Butler, and D. H. Raguin, in Proc. SPIE 5216, 178 (2003).

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Figures (3)

Fig. 1
Fig. 1

Spectral response of the diffraction efficiency of reflection gratings recorded at different energetic exposures in a solgel photopolymerizable material.

Fig. 2
Fig. 2

Intensity dependence of diffraction efficiency at a wavelength of 532 nm . Each point corresponds to the main value obtained from the peak of the angular selectivity curve of a reflection grating recorded in a 550 μ m solgel photopolymerizable material. The exposure time was 0.5 s . Dotted curve, fit using Eq. (1).

Fig. 3
Fig. 3

Dependence of the diffraction efficiency at a wavelength of 532 nm on the total energetic exposure at different intensities. The values are obtained from the peak of the angular selectivity curve of a reflection grating recorded in a 550 μ m solgel photopolymerizable material. For clarity only the curves fitted using Eq. (1) are shown ( r 2 > 0.91 ) .

Tables (2)

Tables Icon

Table 1 Composition of Silica Glass Photosensitive Materials Studied

Tables Icon

Table 2 Fitted Parameters of Energetic Variation of Diffraction Efficiency at Different Intensities

Equations (1)

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η = η 0 tanh 2 ( π β E λ c R c S ) ,

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