Abstract

We report achromatic form-birefringence wave plates for optical pickup units. Material dispersion and structure dispersion are balanced in a rigorous multilayer design. A trilayer grating using SiNxSiOyNzSiO2 provides easily accessible process control points and relaxed fabrication tolerance. We demonstrate precise patterning by using nanoimprint lithography on UV-curable polymers, alleviating a major fabrication challenge. The achromatic wave plates exhibit 90±3° retardance and >95% transmittance as measured by a Mueller matrix method at wavelengths of 640800nm.

© 2005 Optical Society of America

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2005 (2)

2004 (2)

H. Lajunen, J. Tervo, and J. Turunen, Opt. Lett. 29, 203 (2004).
[CrossRef]

U. Levy and Y. Fainman, J. Opt. Soc. Am. A 21, 881 (2004).
[CrossRef]

2003 (1)

2001 (1)

1999 (2)

G. P. Nordin and P. C. Deguzman, Opt. Express 5, 163 (1999).
[CrossRef] [PubMed]

G. P. Nordin, J. T. Meier, P. C. Deguzman, and M. W. Jones, J. Opt. Soc. Am. A 15, 1168 (1999).
[CrossRef]

1997 (1)

1996 (3)

1995 (1)

H. Kikuta, H. Yoshida, and K. Iwata, Opt. Rev. 2, 92 (1995).
[CrossRef]

1990 (1)

1985 (1)

1983 (2)

D. C. Flanders, Appl. Phys. Lett. 42, 492 (1983).
[CrossRef]

R. C. Enger and S. K. Case, Appl. Opt. 22, 3220 (1983).
[CrossRef]

1977 (1)

Biener, G.

Boulbry, B.

Bousquet, B.

Case, S. K.

Cescato, L. H.

Chen, L.

Chipman, R. A.

Deguzman, P. C.

G. P. Nordin, J. T. Meier, P. C. Deguzman, and M. W. Jones, J. Opt. Soc. Am. A 15, 1168 (1999).
[CrossRef]

G. P. Nordin and P. C. Deguzman, Opt. Express 5, 163 (1999).
[CrossRef] [PubMed]

Deng, J.

Deng, X.

Enger, R. C.

Fainman, Y.

Flanders, D. C.

D. C. Flanders, Appl. Phys. Lett. 42, 492 (1983).
[CrossRef]

Gluch, E.

Gu, C.

Guern, Y.

Hariharan, P.

P. Hariharan, Opt. Eng. 35, 3335 (1996).
[CrossRef]

Hong, C.-S.

Iwata, K.

H. Kikuta, Y. Ohira, and K. Iwata, Appl. Opt. 36, 1566 (1997).
[CrossRef] [PubMed]

H. Kikuta, H. Yoshida, and K. Iwata, Opt. Rev. 2, 92 (1995).
[CrossRef]

Jones, M. W.

G. P. Nordin, J. T. Meier, P. C. Deguzman, and M. W. Jones, J. Opt. Soc. Am. A 15, 1168 (1999).
[CrossRef]

Kikuta, H.

H. Kikuta, Y. Ohira, and K. Iwata, Appl. Opt. 36, 1566 (1997).
[CrossRef] [PubMed]

H. Kikuta, H. Yoshida, and K. Iwata, Opt. Rev. 2, 92 (1995).
[CrossRef]

Kitagawa, M.

Lajunen, H.

H. Lajunen, J. Tervo, and J. Turunen, Opt. Lett. 29, 203 (2004).
[CrossRef]

Le Jeune, B.

Levy, U.

Liu, F.

Lotrian, J.

Lu, S. Y.

Meier, J. T.

G. P. Nordin, J. T. Meier, P. C. Deguzman, and M. W. Jones, J. Opt. Soc. Am. A 15, 1168 (1999).
[CrossRef]

Nordin, G. P.

G. P. Nordin and P. C. Deguzman, Opt. Express 5, 163 (1999).
[CrossRef] [PubMed]

G. P. Nordin, J. T. Meier, P. C. Deguzman, and M. W. Jones, J. Opt. Soc. Am. A 15, 1168 (1999).
[CrossRef]

Ohira, Y.

Sciortino, P.

Sciortino, P. F.

Streibl, N.

Tai, S.

Tateda, M.

Tervo, J.

H. Lajunen, J. Tervo, and J. Turunen, Opt. Lett. 29, 203 (2004).
[CrossRef]

Turunen, J.

H. Lajunen, J. Tervo, and J. Turunen, Opt. Lett. 29, 203 (2004).
[CrossRef]

Wang, J.

Yariv, A.

Yeh, P.

Yoshida, H.

H. Kikuta, H. Yoshida, and K. Iwata, Opt. Rev. 2, 92 (1995).
[CrossRef]

Zhang, W.

Appl. Opt. (4)

Appl. Phys. Lett. (1)

D. C. Flanders, Appl. Phys. Lett. 42, 492 (1983).
[CrossRef]

J. Lightwave Technol. (1)

J. Opt. Soc. Am. (1)

J. Opt. Soc. Am. A (4)

Opt. Eng. (1)

P. Hariharan, Opt. Eng. 35, 3335 (1996).
[CrossRef]

Opt. Express (2)

Opt. Lett. (3)

Opt. Rev. (1)

H. Kikuta, H. Yoshida, and K. Iwata, Opt. Rev. 2, 92 (1995).
[CrossRef]

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Figures (4)

Fig. 1
Fig. 1

Simulated retardance spectra of the wave plate at surface normal incidence. The numbers in parentheses are the grating periods.

Fig. 2
Fig. 2

Simulated transmittance spectra of the wave plate at surface normal incidence at different processing steps: (a) Tq(films)—after thin-film depositions (ARC glass buffer layers Si N x Si O y N z Si O 2 ); (b) Ts ( 330 nm - RIE ) , Tp ( 330 nm - RIE ) , Tq ( 330 nm - RIE ) —transmittance of TE, TM, and randomly polarized electromagnetic waves after RIE; (c) Tq ( 330 nm ) —transmittance of the completed structure.

Fig. 3
Fig. 3

Scanning electron micrograph of the wave plates (a) after RIE on a 0.43 mm glass substrate and (b) the finished device on a 1.135 mm glass of the same type as in (a).

Fig. 4
Fig. 4

Measured transmittance (Trans, Max Trans, and Min Trans; see Ref. [18]) and retardance at surface normal incidence. Simulated transmittances, Tq ( 330 nm ) and Phi ( 330 nm ) , overlap the measured transmittance for comparison.

Tables (1)

Tables Icon

Table 1 Optimized Parameters for the Achromatic Wave Plate

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