Abstract

An experiment was performed on a new gray-scale mask material. The mask material is carbon based and has high attenuation in the deep ultraviolet spectral range. The experiment involves making a gray-scale mask for an axicon. Preliminary results show that gray-scale profiles of accurate transmittance functions can be fabricated. Potentially, the capability at deep ultraviolet wavelengths will allow the fabrication of high-resolution components. The high-attenuation characteristic will allow the production of microscale and mesoscale optics of more phase levels.

© 2004 Optical Society of America

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References

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  1. G. J. Swanson and W. B. Veldkamp, “High-efficiency, multi-level diffractive optical elements,” U.S. patent4,895,790 (January23, 1990).
  2. G. J. Swanson, “Binary optics technology: theoretical limits on the diffraction efficiency of multi-level diffractive optical elements,” (MIT, Cambridge, Mass., 1991).
  3. W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
    [CrossRef]
  4. W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
    [CrossRef]
  5. C. Wu, “Method of making high energy beam sensitive glass,” U.S. patent5,078,771 (January7, 1992).
  6. “Properties of HEBS-Glass,” (Canyon Materials, Inc., San Diego, Calif.), retrieved March10, 2003, http://www.canyonmaterials.com/prop_hebs1.html .
  7. M. R. Wang and H. Su, Opt. Lett. 23, 876 (1998).
    [CrossRef]
  8. E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
    [CrossRef]
  9. C. Gimkiewicz, D. Hagedorn, J. Jahns, E. B. Kley, and F. Thoma, Appl. Opt. 38, 2986 (1999).
    [CrossRef]
  10. S. H. Lee, M. S. Jin, and M. L. Scott, “Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics,” U.S. patent6,534,221 (March18, 2003).

1999 (2)

E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
[CrossRef]

C. Gimkiewicz, D. Hagedorn, J. Jahns, E. B. Kley, and F. Thoma, Appl. Opt. 38, 2986 (1999).
[CrossRef]

1998 (1)

1997 (1)

1996 (1)

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

Cumme, M.

E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
[CrossRef]

Daschner, W.

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
[CrossRef]

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

Gimkiewicz, C.

Hagedorn, D.

Jahns, J.

Jin, M. S.

S. H. Lee, M. S. Jin, and M. L. Scott, “Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics,” U.S. patent6,534,221 (March18, 2003).

Kley, E. B.

E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
[CrossRef]

C. Gimkiewicz, D. Hagedorn, J. Jahns, E. B. Kley, and F. Thoma, Appl. Opt. 38, 2986 (1999).
[CrossRef]

Lee, S. H.

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
[CrossRef]

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

S. H. Lee, M. S. Jin, and M. L. Scott, “Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics,” U.S. patent6,534,221 (March18, 2003).

Long, P.

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
[CrossRef]

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

Scott, M. L.

S. H. Lee, M. S. Jin, and M. L. Scott, “Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics,” U.S. patent6,534,221 (March18, 2003).

Stein, R.

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
[CrossRef]

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

Su, H.

Swanson, G. J.

G. J. Swanson and W. B. Veldkamp, “High-efficiency, multi-level diffractive optical elements,” U.S. patent4,895,790 (January23, 1990).

G. J. Swanson, “Binary optics technology: theoretical limits on the diffraction efficiency of multi-level diffractive optical elements,” (MIT, Cambridge, Mass., 1991).

Thoma, F.

Veldkamp, W. B.

G. J. Swanson and W. B. Veldkamp, “High-efficiency, multi-level diffractive optical elements,” U.S. patent4,895,790 (January23, 1990).

Wang, M. R.

Wittig, L. C.

E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
[CrossRef]

Wu, C.

E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
[CrossRef]

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
[CrossRef]

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

C. Wu, “Method of making high energy beam sensitive glass,” U.S. patent5,078,771 (January7, 1992).

Appl. Opt. (2)

J. Vac. Sci. Technol. B (1)

W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
[CrossRef]

Opt. Lett. (1)

Proc. SPIE (1)

E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
[CrossRef]

Other (5)

S. H. Lee, M. S. Jin, and M. L. Scott, “Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics,” U.S. patent6,534,221 (March18, 2003).

C. Wu, “Method of making high energy beam sensitive glass,” U.S. patent5,078,771 (January7, 1992).

“Properties of HEBS-Glass,” (Canyon Materials, Inc., San Diego, Calif.), retrieved March10, 2003, http://www.canyonmaterials.com/prop_hebs1.html .

G. J. Swanson and W. B. Veldkamp, “High-efficiency, multi-level diffractive optical elements,” U.S. patent4,895,790 (January23, 1990).

G. J. Swanson, “Binary optics technology: theoretical limits on the diffraction efficiency of multi-level diffractive optical elements,” (MIT, Cambridge, Mass., 1991).

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Figures (4)

Fig. 1
Fig. 1

Comparison of optical density between HEBS glass and a new LAF.

Fig. 2
Fig. 2

Fabrication process of gray-scale mask.

Fig. 3
Fig. 3

Axicon in LAF measured by atomic force microscopy.

Fig. 4
Fig. 4

Transmission comparison between the designed and the fabricated gray-scale steps on the mask. The data were measured at a wavelength of 315 nm, which is the central wavelength of the spectral range of a Karl Suss MJB-UV300 aligner available for this measurement.

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