Abstract

Athermal silica-based interferometer-type planar light-wave circuits were realized by a newly developed multicore fabrication method. In this method, inductively coupled plasma-enhanced chemical-vapor deposition and polishing technologies are adopted on a silica substrate with a trench-type waveguide pattern prepared by reactive ion etching. Two kinds of deposited core material, 10GeO290SiO2 (mol. %) and 8GeO25B2O387SiO2 (mol. %), which show wavelength temperature dependence of 9.7 and 8.1 pm/°C, respectively, were used to prepare the waveguide sections in a device. By adjustment of the lengths of waveguide sections with these two different core materials, athermal characteristics of less than 0.5 pm/°C were achieved for Mach–Zehnder interferometer filter devices at the 1.55µm wavelength range while the temperature varied from -20 to 80 °C. The new method is also applicable for the preparation of many other kinds of functional devices.

© 2003 Optical Society of America

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