Abstract
Holographic lithography is an ideal technique for fabricating three-dimensional
photonic crystals. However, a critical stage in the fabrication is the minute
alignment of the layers with one another. We present a simple moirelike alignment
technique with better than 20-nm translation resolution and rotation resolution. This technique can easily be extended to other
situations when low-cost, high-precision alignment is needed.
© 2002 Optical Society of America
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