Abstract
Novel materials processing by a multiwavelength excitation process using and KrF excimer lasers for high-efficiency and high-speed refractive-index modification of fused silica is demonstrated. We find this process to be essentially superior to single-wavelength -laser processing: The multiwavelength excitation process achieves more than twice the diffraction efficiency of fused silica modified by a laser at the same total number of photons in each irradiated laser beam supplied to the fused-silica substrate. This superiority is attributed to a resonance-photoionization-like process based on excited-state absorption.
© 2002 Optical Society of America
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