Abstract

We report a sensitive surface and feature measurement technique that uses a novel imaging ellipsometer. Polarization signatures from unresolved subwavelength structures are utilized as a sensitive measure of linewidth. A focused beam rigorous coupled wave analysis method is developed to simulate the polarization effects from isolated subwavelength structures. Experimental results show that this technique can accurately measure linewidths down to 100 nm with an imaging system whose diffraction-limited resolution is 500 nm. The accuracy of our measurements is 10 nm for lines that are broader than 100 nm.

© 2002 Optical Society of America

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References

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  1. B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
    [CrossRef]
  2. X. Wang, J. Mason, M. Latta, T. Strand, D. Marx, and D. Psaltis, J. Opt. Soc. Am. A 18, 565 (2001).
    [CrossRef]
  3. J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
    [CrossRef]
  4. K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
    [CrossRef]
  5. M. G. Moharam and T. K. Gaylord, J. Opt. Soc. Am. 72, 1385 (1982).

2001 (1)

2000 (1)

K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
[CrossRef]

1998 (2)

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
[CrossRef]

1982 (1)

Chen, J.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

Coulombe, S. A.

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
[CrossRef]

Fanton, J.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

Gaylord, T. K.

Latta, M.

Leng, J. M.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

Marx, D.

Mason, J.

McNeil, J. R.

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
[CrossRef]

Minhas, B. K.

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
[CrossRef]

Moharam, M. G.

Naqvi, S. S. H.

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
[CrossRef]

Ooki, H.

K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
[CrossRef]

Opsal, J.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

Osawa, H.

K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
[CrossRef]

Otaki, K.

K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
[CrossRef]

Psaltis, D.

Ritz, K.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

Saito, J.

K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
[CrossRef]

Senko, M.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

Strand, T.

Wang, X.

Appl. Opt. (1)

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, Appl. Opt. 37, 51125115 (1998).
[CrossRef]

J. Opt. Soc. Am. (1)

J. Opt. Soc. Am. A (1)

Jpn. J. Appl. Phys. (1)

K. Otaki, H. Osawa, H. Ooki, and J. Saito, Jpn. J. Appl. Phys. 39, 698 (2000).
[CrossRef]

Thin Solid Films (1)

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, Thin Solid Films 313-314, 308 (1998).
[CrossRef]

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Figures (4)

Fig. 1
Fig. 1

Diagram of the setup used in optical model. The transmission axis of the polarizer is aligned with the x direction, and the transmission axis of the analyzer is aligned with the y direction.

Fig. 2
Fig. 2

FB-RCWA simulation results for various edge slopes and undercuttings.

Fig. 3
Fig. 3

Imaging ellipsometer data of submicrometer PMMA lines. (a) Ratio signal image. (b) Line scan of (a).

Fig. 4
Fig. 4

Theoretical and experimental polarization ratio data for electron-beam-written submicrometer PMMA mesas on silicon.

Equations (2)

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Pθ,φ=K212rp2 cos2 φ+12rs2 sin2 φ-12rprssin 2φ sin δpsf2 sin θdθdφ
Pθ,φ=K212rp2 cos2 φ+12rs2 sin2 φ+12rprssin 2φ sin δpsf2 sin θdθdφ

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