Abstract

Two-dimensional periodic structures were fabricated upon a fluorine-doped SiO2 film in which the fluorine content changed gradually in the direction of film thickness. The films were deposited by plasma-enhanced chemical-vapor deposition. The film was periodically patterned into a 1μm period and an 1μm-groove depth by inductive coupled plasma reactive-ion etching followed by chemical etching in a diluted HF solution. A surface reflectance of 0.7% was attained at 1.85μm wavelength, a value that is one fifth as large as the 3.5% Fresnel reflection of a SiO2 substrate with a flat surface.

© 2001 Optical Society of America

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