Measurements of the thickness distribution of thin films with a slit-beam-profile reflectometer

Abstract

The thickness distribution of single-layer thin films is measured with a slit-beam-profile reflectometer. A convergent slit beam generated by a cylindrical lens is projected onto a specimen. A CCD chip with a pixel matrix of $512\times 480$ is used to detect the intensity distribution of the reflected beam, which is passed through another cylindrical lens. By analyzing the picture taken by the CCD, we can obtain information about the angular reflectance at each reflecting point along the slit line, and the thickness or the refractive index at each point can be evaluated by mathematical fitting to a reflectance formula.

© 2000 Optical Society of America

Optical characterization of extremely small volumes of liquid in sub-micro-holes by simultaneous reflectivity, ellipsometry and spectrometry

M. Holgado, R. Casquel, B. Sánchez, C. Molpeceres, M. Morales, and J. L. Ocaña
Opt. Express 15(20) 13318-13329 (2007)

High-spatial-resolution nulling microellipsometer using rotational polarization symmetry

Alain Tschimwang and Qiwen Zhan
Appl. Opt. 49(9) 1574-1580 (2010)

Compact ellipsometer employing a static polarimeter module with arrayed polarizer and wave-plate elements

Takashi Sato, Takeshi Araki, Yoshihiro Sasaki, Toshihide Tsuru, Toshiyasu Tadokoro, and Shojiro Kawakami
Appl. Opt. 46(22) 4963-4967 (2007)

Fabrication and performance of a medium-dependent SiO₂/Si photonic heterostructure device

D. T. Zhao, H. Zhou, Z. M. Jiang, Y. L. Fan, and Xun Wang
Opt. Lett. 28(10) 843-845 (2003)

Air gap resonant tunneling bandpass filter and polarizer

A. Melnyk, M. H. Bitarafan, T. W. Allen, and R. G. DeCorby
Opt. Lett. 41(8) 1845-1848 (2016)