Abstract

The resolution limits of conventional optical lithography reflect the low-pass spatial-frequency numerical aperture NA/λ filter characteristics of the imaging system. Imaging interferometric lithography extends the resolution of optical lithography to the spatial-frequency limits of optics 2/λ. Off-axis illumination downshifts the high-frequency components of the mask pattern. An interferometric beam at the wafer upshifts these frequency components back to their original spatial frequencies following the lens. 2× reduction imaging interferometric lithography experiments demonstrate a continuous frequency coverage up to 3N.A./λ with a consequent threefold resolution enhancement.

© 1999 Optical Society of America

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