Abstract

We report on crystallization of 15.7GeO2·84.3SiO2 (in mol.%) glass by poling with ArF-laser excitation. The UV intensity was 100mJ/cm2/pulse, and the number of shots was 104. The crystallites that were observed in the glass were approximately 1520 µm in diameter. The crystallization feature was dependent on the poling electric field, showing a threshold field of 0.5×105 V/cm, beyond which crystallization occurred.

© 1999 Optical Society of America

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  1. T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
    [CrossRef]
  2. T. Fujiwara, M. Takahashi, and A. J. Ikushima, Appl. Phys. Lett. 71, 1032 (1997).
    [CrossRef]
  3. T. Fujiwara, M. Takahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).
    [CrossRef]
  4. H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
    [CrossRef]
  5. K. Kawamura, H. Hosono, and H. Kawazoe, J. Appl. Phys. 80, 1357 (1996).
    [CrossRef]
  6. S. Matsumoto, T. Fujiwara, M. Ohama, and A. J. Ikushima, “Crystallization and optical nonlinearites in GeO2–SiO2 glass poled with ArF laser,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, and T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., to be published).

1997 (2)

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Appl. Phys. Lett. 71, 1032 (1997).
[CrossRef]

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).
[CrossRef]

1996 (1)

K. Kawamura, H. Hosono, and H. Kawazoe, J. Appl. Phys. 80, 1357 (1996).
[CrossRef]

1995 (1)

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

1994 (1)

H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
[CrossRef]

Fleming, S.

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

Fujiwara, T.

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).
[CrossRef]

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Appl. Phys. Lett. 71, 1032 (1997).
[CrossRef]

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

S. Matsumoto, T. Fujiwara, M. Ohama, and A. J. Ikushima, “Crystallization and optical nonlinearites in GeO2–SiO2 glass poled with ArF laser,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, and T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., to be published).

Hosono, H.

K. Kawamura, H. Hosono, and H. Kawazoe, J. Appl. Phys. 80, 1357 (1996).
[CrossRef]

H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
[CrossRef]

Ikushima, A. J.

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).
[CrossRef]

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Appl. Phys. Lett. 71, 1032 (1997).
[CrossRef]

S. Matsumoto, T. Fujiwara, M. Ohama, and A. J. Ikushima, “Crystallization and optical nonlinearites in GeO2–SiO2 glass poled with ArF laser,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, and T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., to be published).

Kawamura, K.

K. Kawamura, H. Hosono, and H. Kawazoe, J. Appl. Phys. 80, 1357 (1996).
[CrossRef]

Kawazoe, H.

K. Kawamura, H. Hosono, and H. Kawazoe, J. Appl. Phys. 80, 1357 (1996).
[CrossRef]

Kudo, A.

H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
[CrossRef]

Matsumoto, S.

S. Matsumoto, T. Fujiwara, M. Ohama, and A. J. Ikushima, “Crystallization and optical nonlinearites in GeO2–SiO2 glass poled with ArF laser,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, and T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., to be published).

Matsunami, N.

H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
[CrossRef]

Ohama, M.

S. Matsumoto, T. Fujiwara, M. Ohama, and A. J. Ikushima, “Crystallization and optical nonlinearites in GeO2–SiO2 glass poled with ArF laser,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, and T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., to be published).

Ohtsuka, T.

H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
[CrossRef]

Poole, S.

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

Sceats, M.

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

Takahashi, M.

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).
[CrossRef]

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Appl. Phys. Lett. 71, 1032 (1997).
[CrossRef]

Wong, D.

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

Zhao, Y.

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

Appl. Phys. Lett. (2)

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Appl. Phys. Lett. 71, 1032 (1997).
[CrossRef]

H. Hosono, N. Matsunami, A. Kudo, and T. Ohtsuka, Appl. Phys. Lett. 65, 1632 (1994).
[CrossRef]

Electron. Lett. (2)

T. Fujiwara, M. Takahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).
[CrossRef]

T. Fujiwara, D. Wong, Y. Zhao, S. Fleming, S. Poole, and M. Sceats, Electron. Lett. 31, 573 (1995).
[CrossRef]

J. Appl. Phys. (1)

K. Kawamura, H. Hosono, and H. Kawazoe, J. Appl. Phys. 80, 1357 (1996).
[CrossRef]

Other (1)

S. Matsumoto, T. Fujiwara, M. Ohama, and A. J. Ikushima, “Crystallization and optical nonlinearites in GeO2–SiO2 glass poled with ArF laser,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, and T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., to be published).

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Figures (4)

Fig. 1
Fig. 1

XRD patterns of the glasses with three different stages.

Fig. 2
Fig. 2

Photographs of the surface of as-prepared and UV-poled glass with poling electric field of 3.0×105 V/cm.

Fig. 3
Fig. 3

Photographs of magnified particles and microscopic Raman spectra, A, at a point without any particles, B, at a particle just on the surface, and, C, at another particle near 15 µm below the surface.

Fig. 4
Fig. 4

XRD intensity ratios of 22° peak to amorphous peak as a function of poling electric-field strength.

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