Abstract

Photosensitive effects distinguished as type I and type IIA photosensitivity within optical fibers were observed in a much more pronounced form within germanosilica waveguides deposited by hollow-cathode plasma-enhanced chemical-vapor deposition. With increasing exposure to 193-nm UV light, positive index changes greater than 2×10-3 were observed, followed by negative index changes greater than -5×10-3. These behaviors are attributed to an increase in macroscopic polarizability and a reduction in material density, respectively. The negative index change is more temperature resistant and is fully annealed only at 900?°C, whereas the positive one is annealed at 500?°C.

© 1998 Optical Society of America

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